Known targets — ChEMBL curated mechanism
GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQ
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC22A1 | O15245 | 3/20 | 0.47 |
| ▸ | DNM1 | Q05193 | 11/20 | 0.38 |
| ▸ | APAF1 | O14727 | 1/20 | 0.38 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.38 |
| ▸ | RAD52 | P43351 | 1/20 | 0.38 |
| ▸ | HTT | P42858 | 2/20 | 0.35 |
| ▸ | SLC22A2 | O15244 | 1/20 | 0.33 |
| ▸ | LSS | P48449 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL144694 | 0.96 | SLC22A1 (0.50) | SLC22A1DNM1HTTSLC22A2LSS | |
| Iodide SCHEMBL237492 | 0.92 | SLC22A1 (0.47) | SLC22A1DNM1APAF1HSP90AA1RAD52 | |
| Hydrochloric Acid SCHEMBL240453 | 0.92 | SLC22A1 (0.47) | SLC22A1DNM1HSP90AA1RAD52HTT | |
| Bromide SCHEMBL238492 | 0.92 | SLC22A1 (0.47) | SLC22A1DNM1HSP90AA1RAD52HTT | |
| Fluoride Ion SCHEMBL4615667 | 0.92 | SLC22A1 (0.47) | SLC22A1DNM1APAF1HSP90AA1RAD52 | |
| Water SCHEMBL18549353 | 0.87 | SLC22A1 (0.47) | SLC22A1DNM1APAF1HSP90AA1RAD52 | |
| Water SCHEMBL19639224 | 0.85 | SLC22A1 (0.41) | SLC22A1DNM1APAF1HSP90AA1RAD52 | |
| Water SCHEMBL31503925 | 0.85 | SLC22A1 (0.41) | SLC22A1DNM1APAF1HSP90AA1RAD52 | |
| SCHEMBL3312353 | 0.82 | SLC22A1 (0.50) | SLC22A1DNM1HTTSLC22A2LSS | |
| SCHEMBL6839718 | 0.82 | SLC22A1 (0.39) | SLC22A1DNM1HTTLSS |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 790 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119976882-A | Method for synthesizing hierarchical pore molecular sieve | 中国石油大学(华东) | 2025-05-13 | — | — | CN | claimed |
| CN-112859549-B | Developing solution for retarding AlN substrate corrosion | 宁波南大光电材料有限公司 | 2025-02-21 | — | — | CN | claimed |
| CN-118814176-A | Cleaning composition for chip after chemical mechanical polishing, preparation method and application thereof | 浙江奥首材料科技有限公司 | 2024-10-22 | — | — | CN | claimed |
| CN-118771403-A | Modified titanium-silicon molecular sieve, titanium-silicon molecular sieve supported metal nanoparticle catalyst, preparation method and propylene gas-phase epoxidation method | 中国石油化工股份有限公司 | 2024-10-15 | — | — | CN | claimed |
| US-12054578-B2 | Process for producing porous materials | AEROGEL-IT GMBH (DE) | 2024-08-06 | — | — | US | claimed |
| CN-118179577-A | Alkali treatment-metal synergistic modified ZSM-5 molecular sieve catalyst | 中国石油天然气股份有限公司 | 2024-06-14 | — | — | CN | claimed |
| CN-117772270-A | Double-function catalyst for packaging Ni@H-MCM-22 molecular sieve and preparation method thereof | 中国石油化工股份有限公司 | 2024-03-29 | — | — | CN | claimed |
| CN-117761977-A | Corrosion-resistant alkaline developer | 国科天骥(滨州)新材料有限责任公司 | 2024-03-26 | — | — | CN | claimed |
| CN-117170199-A | Dry film stripping liquid and application thereof | 芝普企业股份有限公司 | 2023-12-05 | — | — | CN | claimed |
| CN-110139829-B | Polyaluminium salts and their use in the preparation of high purity colloidal aluminum-silica composite particles and zeolites | 埃科莱布美国股份有限公司 | 2023-10-13 | — | — | CN | claimed |
| CN-1428659-A | Stripping liquid for photoresist and photoresist stripping method using said stripping liguid | TOKYO APPLIED CHEMICAL INDUSTR (JP) | 2003-07-09 | — | — | CN | claimed |
| EP-1056686-A4 | PROCESS FOR RECOVERING ONIUM HYDROXIDES FROM SOLUTIONS CONTAINING ONIUM COMPOUNDS | SACHEM INC (US) | 2001-11-14 | — | — | EP | claimed |
| US-6207039-B1 | CHARGING SOLUTION CONTAINING ONIUM COMPOUND TO ELECTROCHEMICAL CELL COMPRISING AT LEAST TWO COMPARTMENTS, ONE COMPRISING ION EXCHANGE MATERIAL, CATHODE, ANODE, DIVIDER, PASSING CURRENT THROUGH CELL TO PRODUCE ONIUM SALT, RECOVERING SALT | SACHEM, INC. | 2001-03-27 | — | — | US | claimed |
| EP-1056686-A1 | PROCESS FOR RECOVERING ONIUM HYDROXIDES FROM SOLUTIONS CONTAINING ONIUM COMPOUNDS | Sachem, Inc. (US) | 2000-12-06 | — | — | EP | claimed |
| EP-1027415-A1 | CLEANING COMPOSITIONS AND METHODS FOR CLEANING RESIN AND POLYMERIC MATERIALS USED IN MANUFACTURE | Kyzen Corporation (US) | 2000-08-16 | — | — | EP | claimed |
| US-6054061-A | HYDROGEN PEROXIDE, INORGANIC ACID, AN AMINE FREE OF A SURFACTANT GROUP A CORROSION INHIBITOR; TREATING A METAL SURFACE TO INCREASE ITS SURFACE ROUGHNESS FOR SUBSEQUENT ADHESION TO A POLYMER LAYER. | SHIPLEY COMPANY, L.L.C. (US) | 2000-04-25 | — | — | US | claimed |
| US-5968338-A | Process for recovering onium hydroxides from solutions containing onium compounds | SACHEM, INC. (US) | 1999-10-19 | — | — | US | claimed |
| WO-1999051529-A1 | PROCESS FOR RECOVERING ONIUM HYDROXIDES OR ONIUM SALTS FROM SOLUTIONS CONTAINING ONIUM COMPOUNDS USING ELECTROCHEMICAL ION EXCHANGE | SACHEM, INC. (US) | 1999-10-14 | — | — | WO | claimed |
| WO-1999036363-A1 | PROCESS FOR RECOVERING ONIUM HYDROXIDES FROM SOLUTIONS CONTAINING ONIUM COMPOUNDS | SACHEM, INC. (US) | 1999-07-22 | — | — | WO | claimed |
| WO-1999016855-A1 | CLEANING COMPOSITIONS AND METHODS FOR CLEANING RESIN AND POLYMERIC MATERIALS USED IN MANUFACTURE | KYZEN CORPORATION (US) | 1999-04-08 | — | — | WO | claimed |