Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | USP2 | O75604 | 1/20 | 0.35 |
| ▸ | MEN1 | O00255 | 10/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 10/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | ATM | Q13315 | 1/20 | 0.30 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15024838 | 0.92 | ALDH1A1 (0.34) | ALDH1A1USP2MEN1KMT2ANPC1 | |
| SCHEMBL15025104 | 0.85 | ALDH1A1 (0.39) | ALDH1A1USP2MEN1KMT2ANPC1 | |
| SCHEMBL15025392 | 0.84 | ALDH1A1 (0.35) | ALDH1A1USP2MEN1KMT2ANPC1 | |
| SCHEMBL15025355 | 0.83 | USP2 (0.50) | ALDH1A1USP2MEN1KMT2AATM | |
| SCHEMBL15025252 | 0.82 | ALDH1A1 (0.33) | ALDH1A1USP2MEN1KMT2A | |
| SCHEMBL15025115 | 0.78 | ALDH1A1 (0.38) | ALDH1A1USP2MEN1KMT2ANPC1 | |
| SCHEMBL15024836 | 0.75 | USP2 (0.47) | ALDH1A1USP2MEN1KMT2AATM | |
| SCHEMBL17828102 | 0.70 | USP2 (0.58) | ALDH1A1USP2MEN1KMT2ANPC1 | |
| SCHEMBL15025112 | 0.68 | USP2 (0.49) | ALDH1A1USP2MEN1KMT2AATM | |
| SCHEMBL14101853 | 0.67 | USP2 (0.50) | ALDH1A1USP2MEN1KMT2ANPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9158191-B2 | Chemically amplified negative resist composition, photo-curable dry film, making method, pattern forming process, and electric/electronic part protecting film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-10-13 | — | — | US | disclosed |
| US-20130149493-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM, MAKING METHOD, PATTERN FORMING PROCESS, AND ELECTRIC/ELECTRONIC PART PROTECTING FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-06-13 | — | — | US | disclosed |