Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15025396 | 0.92 | USP2 (0.31) | USP2TSHR | |
| SCHEMBL15025103 | 0.92 | USP2 (0.36) | USP2TSHR | |
| SCHEMBL15025360 | 0.86 | USP2 (0.35) | USP2TSHR | |
| SCHEMBL15025119 | 0.83 | KDM4E (0.33) | — | |
| SCHEMBL4806264 | 0.80 | USP2 (0.36) | USP2TSHR | |
| SCHEMBL15025255 | 0.75 | KDM4E (0.34) | — | |
| SCHEMBL15024861 | 0.73 | KDM4E (0.37) | — | |
| SCHEMBL15025359 | 0.73 | TSHR (0.31) | TSHR | |
| SCHEMBL15025040 | 0.73 | ALDH1A1 (0.40) | — | |
| SCHEMBL15025387 | 0.72 | USP2 (0.46) | USP2TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9158191-B2 | Chemically amplified negative resist composition, photo-curable dry film, making method, pattern forming process, and electric/electronic part protecting film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-10-13 | — | — | US | disclosed |
| US-20130149493-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM, MAKING METHOD, PATTERN FORMING PROCESS, AND ELECTRIC/ELECTRONIC PART PROTECTING FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-06-13 | — | — | US | disclosed |