Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ZDHHC20 | Q5W0Z9 | 4/20 | 0.69 |
| ▸ | ZDHHC2 | Q9UIJ5 | 2/20 | 0.69 |
| ▸ | CA12 | O43570 | 3/20 | 0.43 |
| ▸ | CA1 | P00915 | 3/20 | 0.43 |
| ▸ | CA9 | Q16790 | 3/20 | 0.43 |
| ▸ | CA2 | P00918 | 1/20 | 0.42 |
| ▸ | TSHR | P16473 | 2/20 | 0.41 |
| ▸ | HPGD | P15428 | 1/20 | 0.41 |
| ▸ | MMP1 | P03956 | 1/20 | 0.41 |
| ▸ | MMP2 | P08253 | 1/20 | 0.41 |
| ▸ | MMP3 | P08254 | 1/20 | 0.41 |
| ▸ | MMP8 | P22894 | 1/20 | 0.41 |
| ▸ | THRB | P10828 | 7/20 | 0.41 |
| ▸ | THRA | P10827 | 6/20 | 0.41 |
| ▸ | FAAH | O00519 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
| ▸ | MGLL | Q99685 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3466858 | 0.98 | ZDHHC20 (0.72) | ZDHHC20ZDHHC2CA12CA1CA9 | |
| SCHEMBL252541 | 0.98 | ZDHHC20 (0.72) | ZDHHC20ZDHHC2CA12CA1CA9 | |
| SCHEMBL372601 | 0.98 | ZDHHC20 (0.72) | ZDHHC20ZDHHC2CA12CA1CA9 | |
| SCHEMBL3389914 | 0.98 | ZDHHC20 (0.72) | ZDHHC20ZDHHC2CA12CA1CA9 | |
| SCHEMBL4081083 | 0.98 | ZDHHC20 (0.72) | ZDHHC20ZDHHC2CA12CA1CA9 | |
| SCHEMBL372802 | 0.98 | ZDHHC20 (0.72) | ZDHHC20ZDHHC2CA12CA1CA9 | |
| SCHEMBL7161000 | 0.98 | ZDHHC20 (0.72) | ZDHHC20ZDHHC2CA12CA1CA9 | |
| SCHEMBL15233342 | 0.98 | ZDHHC20 (0.67) | ZDHHC20ZDHHC2CA12CA1CA9 | |
| SCHEMBL137967 | 0.98 | ZDHHC20 (0.72) | ZDHHC20ZDHHC2CA12CA1CA9 | |
| SCHEMBL372568 | 0.98 | ZDHHC20 (0.72) | ZDHHC20ZDHHC2CA12CA1CA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 130 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8802590-B2 | Indium adsorbent, indium adsorbent producing method, and indium adsorption method | SONY CORPORATION (JP) | 2014-08-12 | — | — | US | claimed |
| US-20070099816-A1 | Hard Surface Cleaning Composition | THE CLOROX COMPANY | 2007-05-03 | — | — | US | claimed |
| EP-0970258-B1 | POLYMERIC COMBINATIONS USED AS COPPER AND PRECIOUS METAL HEAP LEACHING AGGLOMERATION AIDS | NALCO CHEMICAL CO (US) | 2003-05-07 | — | — | EP | claimed |
| EP-0984990-B1 | PREPARATION OF WATER SOLUBLE POLYMER DISPERSIONS FROM VINYLAMIDE MONOMERS | NALCO CHEMICAL CO (US) | 2003-03-19 | — | — | EP | claimed |
| WO-2023243476-A1 | RESIST UNDERLAYER FILM FORMATION COMPOSITION | 日産化学株式会社 | 2023-12-21 | — | — | WO | disclosed |
| US-11834538-B2 | Anionic graft polymerization onto an existing polymer chain by organometallic base activation | EXXONMOBIL CHEMICAL PATENTS INC. (US) | 2023-12-05 | — | — | US | disclosed |
| WO-2023204287-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION | 日産化学株式会社 | 2023-10-26 | — | — | WO | disclosed |
| EP-3894451-A1 | ANIONIC GRAFT POLYMERIZATION ONTO AN EXISTING POLYMER CHAIN BY ORGANOMETALLIC BASE ACTIVATION | ExxonMobil Chemical Patents Inc. (US) | 2021-10-20 | — | — | EP | disclosed |
| WO-2020123125-A1 | ANIONIC GRAFT POLYMERIZATION ONTO AN EXISTING POLYMER CHAIN BY ORGANOMETALLIC BASE ACTIVATION | EXXONMOBIL CHEMICAL PATENTS INC. (US) | 2020-06-18 | — | — | WO | disclosed |
| US-20200190241-A1 | Anionic Graft Polymerization Onto an Existing Polymer Chain by Organometallic Base Activation | EXXONMOBIL CHEMICAL PATENTS INC. | 2020-06-18 | — | — | US | disclosed |
| US-10437150-B2 | Composition for forming resist underlayer film with reduced outgassing | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2019-10-08 | — | — | US | disclosed |
| US-10289002-B2 | Electron beam resist underlayer film-forming composition containing lactone-structure-containing polymer | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2019-05-14 | — | — | US | disclosed |
| US-4304838-A | FILMS FOR PEELABLE DEVELOPMENT | FUJI PHOTO FILM CO., LTD. (JP) | 1981-12-08 | — | — | US | disclosed |
| US-4294905-A | DIAZO COMPOUNDS, OLEOPHILIC AND STORAGE STABLE | FUJI PHOTO FILM CO., LTD. (JP) | 1981-10-13 | — | — | US | disclosed |
| US-4275138-A | Photosensitive diazonium compound containing composition and article with β-hydroxyalkyl acrylate or methacrylate | FUJI PHOTO FILM CO., LTD. (JP) | 1981-06-23 | — | — | US | disclosed |
| US-4178182-A | ACRYLIC ESTER OF POLYOL USED AS POLYMERIZED INTERLAYER OR OVERCOAT, STORAGE STABILITY | FUJI PHOTO FILM CO., LTD (JP) | 1979-12-11 | — | — | US | disclosed |
| US-4175964-A | SUCCESSIVE SURFACE TREATMENT WITH AQUEOUS SOLUTIONS OF PHOSPHORIC ACID AND SILICIC ACID OR ITS SALTS | FUJI PHOTO FILM CO., LTD. (JP) | 1979-11-27 | — | — | US | disclosed |
| US-4172729-A | EXTENDED SHELF LIFE; LOWERED STAINING OF BACKGROUHD AREAS | FUJI PHOTO FILM CO., LTD. (JP) | 1979-10-30 | — | — | US | disclosed |
| US-4123276-A | COPOLYMER OF ACRYLIC ESTER AND NITRILE, DIAZO COMPOUND, PRINTING PLATE | FUJI PHOTO FILM CO., LTD. (JP) | 1978-10-31 | — | — | US | disclosed |
| US-4058443-A | PHOTOPOLYMERIZATION, BINDER, CHLORINATED POLYOLEFIN | FUJI PHOTO FILM CO., LTD. (JA) | 1977-11-15 | — | — | US | disclosed |