SCHEMBL1503485

SCHEMBL1503485

CCOCS(=O)(=O)O.[NaH]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2782961 0.97
Ammonia Solution, Strong SCHEMBL716352 0.94
Ether SCHEMBL27956426 0.82 ALDH1A1 (0.36)
SCHEMBL5050083 0.82 ALDH1A1 (0.43)
Ether SCHEMBL14342973 0.79 ALDH1A1 (0.38)
Ether SCHEMBL828632 0.79 CA5A (0.40)
Ether SCHEMBL6357672 0.79 ALDH1A1 (0.38)
SCHEMBL595425 0.78 CA5A (0.36)
Ether SCHEMBL27956424 0.77 ALDH1A1 (0.36)
SCHEMBL27813054 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7906038-B2 Aqueous polishing liquid and chemical mechanical polishing method FUJIFILM CORPORATION (JP) 2011-03-15 US disclosed
US-20070069176-A1 Aqueous polishing liquid and chemical mechanical polishing method FUJI PHOTO FILM CO., LTD. 2007-03-29 US disclosed