Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RIPK1 | Q13546 | 4/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | CCR2 | P41597 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14428590 | 0.90 | RIPK1 (0.45) | RIPK1LMNAPOLBCCR2ALDH1A1 | |
| SCHEMBL14997672 | 0.83 | RIPK1 (0.41) | RIPK1LMNAPOLBCCR2ALDH1A1 | |
| SCHEMBL13656146 | 0.79 | EPHX1 (0.39) | RIPK1LMNAPOLBCCR2ALDH1A1 | |
| SCHEMBL14838796 | 0.78 | RIPK1 (0.46) | RIPK1LMNAPOLBCCR2ALDH1A1 | |
| SCHEMBL12017039 | 0.78 | RIPK1 (0.41) | RIPK1LMNAPOLBCCR2ALDH1A1 | |
| SCHEMBL14997673 | 0.76 | RIPK1 (0.40) | RIPK1LMNAPOLBCCR2ALDH1A1 | |
| SCHEMBL20100476 | 0.74 | RIPK1 (0.43) | RIPK1LMNAPOLBCCR2ALDH1A1 | |
| SCHEMBL14612345 | 0.74 | RIPK1 (0.39) | RIPK1LMNAPOLBCCR2ALDH1A1 | |
| SCHEMBL19413865 | 0.74 | RIPK1 (0.45) | RIPK1LMNAPOLBCCR2ALDH1A1 | |
| SCHEMBL15045362 | 0.73 | RIPK1 (0.38) | RIPK1LMNAPOLBCCR2ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8778595-B2 | Resist composition, method of forming resist pattern, and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-07-15 | — | — | US | disclosed |
| US-20130157201-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-06-20 | — | — | US | disclosed |