SCHEMBL20100476

SCHEMBL20100476

CCC(C)(C)C(=O)NC(=O)C(C)=O

nearest known ligand 0.43

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
RIPK1 Q13546 6/20 0.43
LMNA P02545 1/20 0.38
POLB P06746 1/20 0.38
L3MBTL1 Q9Y468 2/20 0.33
ALDH1A1 P00352 1/20 0.33
GAA P10253 1/20 0.33
THRB P10828 1/20 0.33
HTT P42858 1/20 0.33
CCR2 P41597 1/20 0.33
MEN1 O00255 2/20 0.32
KMT2A Q03164 2/20 0.32
NPC1 O15118 1/20 0.32
RAB9A P51151 1/20 0.32
DRD2 P14416 1/20 0.31
DRD4 P21917 1/20 0.31
BRD4 O60885 1/20 0.31
CNR2 P34972 3/20 0.30
CNR1 P21554 2/20 0.30
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14428590 0.83 RIPK1 (0.45) RIPK1LMNAPOLBL3MBTL1ALDH1A1
SCHEMBL20100319 0.83 RIPK1 (0.41) RIPK1LMNAPOLBL3MBTL1ALDH1A1
SCHEMBL12017039 0.81 RIPK1 (0.41) RIPK1LMNAPOLBL3MBTL1ALDH1A1
SCHEMBL14838796 0.76 RIPK1 (0.46) RIPK1LMNAPOLBL3MBTL1ALDH1A1
SCHEMBL14997672 0.76 RIPK1 (0.41) RIPK1LMNAPOLBL3MBTL1ALDH1A1
SCHEMBL15045366 0.74 RIPK1 (0.40) RIPK1LMNAPOLBL3MBTL1ALDH1A1
SCHEMBL14997673 0.74 RIPK1 (0.40) RIPK1LMNAPOLBL3MBTL1ALDH1A1
SCHEMBL20100303 0.74 RIPK1 (0.38) RIPK1LMNAPOLBL3MBTL1ALDH1A1
SCHEMBL14612345 0.73 RIPK1 (0.39) RIPK1LMNAPOLBL3MBTL1ALDH1A1
SCHEMBL13656146 0.73 EPHX1 (0.39) RIPK1LMNAPOLBL3MBTL1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10042259-B2 Topcoat compositions and pattern-forming methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2018-08-07 US disclosed
US-10042259-B2 Topcoat compositions and pattern-forming methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2018-08-07 US disclosed
US-20180118970-A1 TOPCOAT COMPOSITIONS AND PATTERN-FORMING METHODS ROHM AND HAAS ELECTRONIC MATERIALS LLC 2018-05-03 US disclosed
US-20180118970-A1 TOPCOAT COMPOSITIONS AND PATTERN-FORMING METHODS ROHM AND HAAS ELECTRONIC MATERIALS LLC 2018-05-03 US disclosed