4-Vinylphenol

4-Vinylphenol

SCHEMBL1506510

C=CC(=O)OC(C)(C)C.C=Cc1ccc(O)cc1.C=Cc1ccc(OCC(=O)OC(C)(C)C)cc1

nearest known ligand 0.48

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.43
KMT2A Q03164 2/20 0.43
NPC1 O15118 1/20 0.43
RAB9A P51151 1/20 0.43
PSEN1 P49768 1/20 0.39
PSEN2 P49810 1/20 0.39
APH1B Q8WW43 1/20 0.39
NCSTN Q92542 1/20 0.39
APH1A Q96BI3 1/20 0.39
PSENEN Q9NZ42 1/20 0.39
PTPN1 P18031 1/20 0.38
MIF P14174 2/20 0.38
PTGS2 P35354 1/20 0.38
LMNA P02545 1/20 0.38
MAPT P10636 1/20 0.38
MAOB P27338 1/20 0.36
ABCG2 Q9UNQ0 1/20 0.36
ALDH1A1 P00352 1/20 0.36
GAA P10253 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
4-Vinylphenol SCHEMBL3332947 0.94 MEN1 (0.47) MEN1KMT2ANPC1RAB9APSEN1
SCHEMBL412718 0.88 MEN1 (0.50) MEN1KMT2ANPC1RAB9APSEN1
4-Vinylphenol SCHEMBL6536375 0.85 MIF (0.48) MEN1KMT2ANPC1RAB9AMIF
SCHEMBL8045161 0.84 MEN1 (0.39) MEN1KMT2ANPC1RAB9AMIF
Styrene SCHEMBL7270853 0.83 PTPN1 (0.49) MEN1KMT2ANPC1RAB9APSEN1
SCHEMBL4598237 0.83 PSEN1 (0.49) MEN1KMT2ANPC1RAB9APSEN1
4-Vinylphenol SCHEMBL1506659 0.81 ELANE (0.49) MEN1KMT2ANPC1RAB9AMIF
4-Vinylphenol SCHEMBL1506668 0.81 HIF1A (0.44) MEN1KMT2APTPN1MIFLMNA
4-Vinylphenol SCHEMBL6255521 0.81 MIF (0.42) MIFPTGS2MAOB
SCHEMBL2964490 0.81 MEN1 (0.49) MEN1KMT2ANPC1RAB9APSEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8158326-B2 Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition FUJIFILM CORPORATION (JP) 2012-04-17 US disclosed
EP-1906238-B1 Photosensitive composition and pattern forming method using the same FUJIFILM CORP (JP) 2011-11-09 EP disclosed
US-7914965-B2 Resist composition and method of pattern formation with the same FUJIFILM CORPORATION (JP) 2011-03-29 US disclosed
US-20090075202-A1 PHOTOSENSITIVE COMPOSITION, COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION, AND METHOD OF PATTERN FORMATION WITH THE PHOTOSENSITIVE COMPOSITION FUJIFILM CORPORATION (JP) 2009-03-19 US disclosed
US-7449573-B2 Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition FUJIFILM CORPORATION (JP) 2008-11-11 US disclosed
EP-1906238-A2 Photosensitive composition and pattern forming method using the same FUJIFILM Corporation (JP) 2008-04-02 EP disclosed
EP-1662317-A2 Resist composition and method of pattern formation with the same FUJI PHOTO FILM CO., LTD. (JP) 2006-05-31 EP disclosed
US-20060068320-A1 Resist composition and method of pattern formation with the same FUJI PHOTO FILM CO., LTD. 2006-03-30 US disclosed
US-20060040203-A1 Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition FUJI PHOTO FILM CO., LTD. 2006-02-23 US disclosed