Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MIF | P14174 | 4/20 | 0.48 |
| ▸ | CA12 | O43570 | 4/20 | 0.41 |
| ▸ | CA1 | P00915 | 4/20 | 0.41 |
| ▸ | CA2 | P00918 | 4/20 | 0.41 |
| ▸ | CA7 | P43166 | 4/20 | 0.41 |
| ▸ | CA9 | Q16790 | 4/20 | 0.41 |
| ▸ | CA14 | Q9ULX7 | 4/20 | 0.41 |
| ▸ | TYR | P14679 | 3/20 | 0.41 |
| ▸ | ALDH5A1 | P51649 | 2/20 | 0.39 |
| ▸ | ABAT | P80404 | 2/20 | 0.39 |
| ▸ | AKR1B10 | O60218 | 2/20 | 0.38 |
| ▸ | AKR1B1 | P15121 | 2/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.36 |
| ▸ | EPAS1 | Q99814 | 1/20 | 0.36 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.35 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| 4-Vinylphenol SCHEMBL6253860 | 0.94 | MIF (0.43) | MIFCA12CA1CA2CA7 | |
| 4-Vinylphenol SCHEMBL6255521 | 0.91 | MIF (0.42) | MIFCA12CA1CA2CA7 | |
| 4-Vinylphenol SCHEMBL7137626 | 0.90 | ESRRG (0.41) | MIFCA12CA1CA2CA7 | |
| 4-Vinylphenol SCHEMBL1506659 | 0.89 | ELANE (0.49) | MIFCA12CA1CA2CA7 | |
| 4-Vinylphenol SCHEMBL1506668 | 0.89 | HIF1A (0.44) | MIFKDM4EMEN1KMT2AHIF1A | |
| 4-Vinylphenol SCHEMBL6675689 | 0.87 | AKR1B10 (0.39) | MIFCA12CA1CA2CA7 | |
| 4-Vinylphenol SCHEMBL28570873 | 0.86 | MIF (0.50) | MIFCA12CA1CA2CA7 | |
| 4-Vinylphenol SCHEMBL1506510 | 0.85 | MEN1 (0.43) | MIFALDH1A1MEN1KMT2ANPC1 | |
| Styrene SCHEMBL6903124 | 0.85 | ALDH1A1 (0.48) | ALDH1A1KDM4EHIF1ACYP2C9TDP1 | |
| Styrene SCHEMBL5008696 | 0.85 | ALDH1A1 (0.48) | ALDH1A1KDM4EHIF1ACYP2C9TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2020129611-A1 | POLYMER HAVING HYDROPHILIC PROTECTING GROUP FOR RESISTS | 丸善石油化学株式会社 | 2020-06-25 | — | — | WO | disclosed |
| US-6756179-B2 | A POSITIVE RESIST COMPRISING: A RESIN CAPABLE OF DECOMPOSING BY THE ACTION OF AN ACID TO INCREASE SOLUBILITY IN AN ALKALI DEVELOPER, AND A COMPOUND CAPABLE OF GENERATING AROMATIC SULFONIC ACID SUBSTITUTED WITH A FLUORINE CONTAINING GROUP | FUJI PHOTO FILM CO., LTD. (JP) | 2004-06-29 | — | — | US | disclosed |
| EP-0843220-B1 | Radiation sensitive resin composition | JSR CORP (JP) | 2003-02-19 | — | — | EP | disclosed |
| US-6485883-B2 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2002-11-26 | — | — | US | disclosed |
| US-20020058200-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2002-05-16 | — | — | US | disclosed |
| US-20010041300-A1 | Positive photoresist composition | FUJIFILM CORPORATION (JP) | 2001-11-15 | — | — | US | disclosed |
| US-6136504-A | COMPRISING A COPOLYMER, A COMPOUND WHICH GENERATES AN ACID WHEN IRRADIATED WITH ACTINIC RAYS OR RADIATION, AND A SOLVENT | FUJI PHOTO FILM CO., LTD. (JP) | 2000-10-24 | — | — | US | disclosed |
| US-5994022-A | BECOMES SOLUBLE IN ALKALI DEVELOPING SOLUTION BY ACTION OF AN ACID | JSR CORPORATION (JP) | 1999-11-30 | — | — | US | disclosed |
| EP-0843220-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-05-20 | — | — | EP | disclosed |