Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTPN1 | P18031 | 1/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.41 |
| ▸ | MAPT | P10636 | 3/20 | 0.41 |
| ▸ | GAA | P10253 | 3/20 | 0.40 |
| ▸ | PPARA | Q07869 | 2/20 | 0.40 |
| ▸ | NPC1 | O15118 | 2/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | CASP3 | P42574 | 1/20 | 0.40 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.40 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.40 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.40 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.40 |
| ▸ | RAB9A | P51151 | 3/20 | 0.39 |
| ▸ | MEN1 | O00255 | 2/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.39 |
| ▸ | GLA | P06280 | 1/20 | 0.39 |
| ▸ | HTT | P42858 | 1/20 | 0.39 |
| ▸ | PPARG | P37231 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Styrene SCHEMBL7270853 | 0.86 | PTPN1 (0.49) | PTPN1SMN1; SMN2MAPTPPARANPC1 | |
| SCHEMBL412718 | 0.83 | MEN1 (0.50) | PTPN1SMN1; SMN2ALDH1A1MAPTGAA | |
| SCHEMBL14527710 | 0.81 | TSHR (0.39) | SMN1; SMN2ALDH1A1LMNAKMT2ACYP2C19 | |
| SCHEMBL2470986 | 0.80 | PPARA (0.45) | PTPN1MAPTPPARANPC1LMNA | |
| SCHEMBL17968233 | 0.80 | ELANE (0.42) | SMN1; SMN2ALDH1A1KDM4EMAPTGAA | |
| SCHEMBL9626778 | 0.80 | PTGS2 (0.46) | SMN1; SMN2ALDH1A1MAPTGAAPPARA | |
| 4-Vinylphenol SCHEMBL3332947 | 0.78 | MEN1 (0.47) | PTPN1MAPTGAANPC1LMNA | |
| SCHEMBL11988598 | 0.76 | CYP2C19 (0.41) | ALDH1A1MAPTNPC1LMNARAB9A | |
| SCHEMBL6774718 | 0.75 | PTGS2 (0.65) | SMN1; SMN2ALDH1A1MAPTGAALMNA | |
| SCHEMBL13704977 | 0.75 | THRB (0.44) | SMN1; SMN2ALDH1A1KDM4EMAPTGAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2016124493-A1 | LATENT ACIDS AND THEIR USE | BASF SE (DE) | 2016-08-11 | — | — | WO | disclosed |
| US-8158326-B2 | Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition | FUJIFILM CORPORATION (JP) | 2012-04-17 | — | — | US | disclosed |
| US-7914965-B2 | Resist composition and method of pattern formation with the same | FUJIFILM CORPORATION (JP) | 2011-03-29 | — | — | US | disclosed |
| US-20090075202-A1 | PHOTOSENSITIVE COMPOSITION, COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION, AND METHOD OF PATTERN FORMATION WITH THE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2009-03-19 | — | — | US | disclosed |
| US-7449573-B2 | Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition | FUJIFILM CORPORATION (JP) | 2008-11-11 | — | — | US | disclosed |
| EP-1769286-A2 | OXIME DERIVATIVES AND THE USE THEROF AS LATENT ACIDS | Ciba Specialty Chemicals Holding Inc. (CH) | 2007-04-04 | — | — | EP | disclosed |
| EP-1662317-A2 | Resist composition and method of pattern formation with the same | FUJI PHOTO FILM CO., LTD. (JP) | 2006-05-31 | — | — | EP | disclosed |
| US-20060068320-A1 | Resist composition and method of pattern formation with the same | FUJI PHOTO FILM CO., LTD. | 2006-03-30 | — | — | US | disclosed |
| US-20060040203-A1 | Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2006-02-23 | — | — | US | disclosed |
| WO-2006008250-A2 | OXIME DERIVATIVES AND THE USE THEROF AS LATENT ACIDS | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2006-01-26 | — | — | WO | disclosed |
| US-6902862-B2 | Resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2005-06-07 | — | — | US | disclosed |
| US-20040058272-A1 | Resist composition | FUJI PHOTO FILM CO., LTD. | 2004-03-25 | — | — | US | disclosed |