Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FKBP1A | P62942 | 2/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.41 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.40 |
| ▸ | CTSL | P07711 | 1/20 | 0.39 |
| ▸ | CTSB | P07858 | 1/20 | 0.39 |
| ▸ | CTSS | P25774 | 1/20 | 0.39 |
| ▸ | CTSK | P43235 | 1/20 | 0.39 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26642990 | 0.84 | CYP1A2 (0.46) | FKBP1AALDH1A1CYP1A2MEN1KMT2A | |
| SCHEMBL3278746 | 0.82 | MEN1 (0.40) | ALDH1A1MEN1KMT2A | |
| SCHEMBL8988402 | 0.82 | MGLL (0.35) | SLC6A3MEN1KMT2A | |
| SCHEMBL7116762 | 0.82 | ALDH1A1 (0.46) | FKBP1AALDH1A1SIGMAR1CTSLCTSB | |
| SCHEMBL219412 | 0.81 | ALDH1A1 (0.40) | ALDH1A1SLC6A3MEN1KMT2A | |
| SCHEMBL8988207 | 0.80 | FKBP1A (0.39) | FKBP1AALDH1A1CYP1A2 | |
| Methacrylic Acid SCHEMBL22607673 | 0.80 | ALDH1A1 (0.44) | FKBP1AALDH1A1SIGMAR1CTSLCTSB | |
| Fluoride SCHEMBL28481017 | 0.79 | ALDH1A1 (0.63) | ALDH1A1SLC6A3MEN1KMT2A | |
| Methacrylic Acid SCHEMBL8988639 | 0.79 | FKBP1A (0.39) | FKBP1AALDH1A1CYP1A2 | |
| SCHEMBL29260524 | 0.79 | CA12 (0.41) | ALDH1A1SLC6A3MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1158363-B1 | Positive resist composition and onium salts of saccharin derivatives | FUJIFILM CORP (JP) | 2014-01-22 | — | — | EP | disclosed |
| US-8206886-B2 | Photosensitive composition and pattern-forming method using the photosensitive composition | FUJIFILM CORPORATION (JP) | 2012-06-26 | — | — | US | disclosed |
| US-8158326-B2 | Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition | FUJIFILM CORPORATION (JP) | 2012-04-17 | — | — | US | disclosed |
| US-8039200-B2 | Photosensitive composition and pattern-forming method using the photosensitive composition | FUJIFILM CORPORATION (JP) | 2011-10-18 | — | — | US | disclosed |
| EP-2375285-A2 | Photosensitive composition and pattern-forming method using the photosensitive composition | FUJIFILM Corporation (JP) | 2011-10-12 | — | — | EP | disclosed |
| US-7914965-B2 | Resist composition and method of pattern formation with the same | FUJIFILM CORPORATION (JP) | 2011-03-29 | — | — | US | disclosed |
| US-20100304300-A1 | PHOTOSENSITIVE COMPOSITION AND PATTERN-FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-12-02 | — | — | US | disclosed |
| US-20090075202-A1 | PHOTOSENSITIVE COMPOSITION, COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION, AND METHOD OF PATTERN FORMATION WITH THE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2009-03-19 | — | — | US | disclosed |
| US-7449573-B2 | Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition | FUJIFILM CORPORATION (JP) | 2008-11-11 | — | — | US | disclosed |
| US-7083892-B2 | Resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2006-08-01 | — | — | US | disclosed |
| US-6060213-A | FOR USE IN THE PROCESS FOR THE PRODUCTION OF LITHOGRAPHIC PRINTING PLATES AND SEMICONDUCTORS SUCH AS INTEGRATED CIRCUITS OR CIRCUIT BOARDS FOR LIQUID CRYSTAL, THERMAL HEAD, ETC. OR OTHER PHOTOFABRICATION PROCESSES | FUJI PHOTO FILM CO., LTD. (KR) | 2000-05-09 | — | — | US | disclosed |
| EP-0524187-B1 | POSITIVE WORKING RESIST COMPOSITIONS AND THEIR UTILITY IN DRY FILM PHOTORESISTS | DU PONT (US) | 1996-07-10 | — | — | EP | disclosed |
| US-5262281-A | Polymers with pendant acid labile a-alkoxyalkyl esters, high resolution, integrated circuits, aqueous development | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-11-16 | — | — | US | disclosed |
| EP-0524250-A1 | RESIST MATERIAL FOR USE IN THICK FILM RESISTS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-01-27 | — | — | EP | disclosed |
| EP-0524187-A1 | POSITIVE WORKING RESIST COMPOSITIONS AND THEIR UTILITY IN DRY FILM PHOTORESISTS. | DU PONT (US) | 1993-01-27 | — | — | EP | disclosed |
| US-5145764-A | Acrylic ester polymer | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-09-08 | — | — | US | disclosed |
| US-5120633-A | Polymers with acid-labile ester/ether pendant groups and acid-generating photoinitiators; positives; printed circuits; resolution | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-06-09 | — | — | US | disclosed |
| US-5077174-A | Aqueous development, stripping | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-12-31 | — | — | US | disclosed |
| WO-1991015808-A1 | RESIST MATERIAL FOR USE IN THICK FILM RESISTS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-10-17 | — | — | WO | disclosed |
| WO-1991015809-A1 | POSITIVE WORKING RESIST COMPOSITIONS AND THEIR UTILITY IN DRY FILM PHOTORESISTS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-10-17 | — | — | WO | disclosed |