Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.58 |
| ▸ | NR4A1 | P22736 | 1/20 | 0.46 |
| ▸ | NR4A2 | P43354 | 1/20 | 0.46 |
| ▸ | NR4A3 | Q92570 | 1/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.41 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.41 |
| ▸ | MEN1 | O00255 | 2/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.41 |
| ▸ | TSHR | P16473 | 2/20 | 0.41 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.41 |
| ▸ | CDC25B | P30305 | 1/20 | 0.41 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 1/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.40 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.38 |
| ▸ | CA12 | O43570 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29563927 | 0.83 | HSD17B10 (0.60) | HSD17B10NR4A1NR4A2NR4A3ALDH1A1 | |
| SCHEMBL1688876 | 0.83 | HSD17B10 (0.60) | HSD17B10NR4A1NR4A2NR4A3ALDH1A1 | |
| SCHEMBL890497 | 0.83 | HSD17B10 (0.51) | HSD17B10NR4A1NR4A2NR4A3ALDH1A1 | |
| Acrylic Acid SCHEMBL29270063 | 0.81 | LMNA (0.40) | HSD17B10ALDH1A1CYP1A2ALOX15KDM4E | |
| Propene SCHEMBL27695613 | 0.81 | HSD17B10 (0.62) | HSD17B10NR4A1NR4A2NR4A3ALDH1A1 | |
| Ethylene SCHEMBL3993074 | 0.80 | HSD17B10 (0.72) | HSD17B10NR4A1NR4A2NR4A3ALDH1A1 | |
| Ethylene SCHEMBL6253400 | 0.80 | HSD17B10 (0.72) | HSD17B10NR4A1NR4A2NR4A3ALDH1A1 | |
| SCHEMBL29404347 | 0.80 | HSD17B10 (0.78) | HSD17B10NR4A1NR4A2NR4A3ALDH1A1 | |
| SCHEMBL7624693 | 0.80 | HSD17B10 (0.78) | HSD17B10NR4A1NR4A2NR4A3ALDH1A1 | |
| Benzene SCHEMBL28110156 | 0.80 | HSD17B10 (0.78) | HSD17B10NR4A1NR4A2NR4A3ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8822588-B2 | Fluorine-containing polymer and anti-static agent wherein same is used | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-09-02 | — | — | US | disclosed |
| US-8513457-B2 | Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-08-20 | — | — | US | disclosed |
| EP-2289954-B1 | FLUORINE-CONTAINING POLYMER AND ANTI-STATIC AGENT WHEREIN SAME IS USED | CENTRAL GLASS CO LTD (JP) | 2013-01-16 | — | — | EP | disclosed |
| US-20120226070-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-09-06 | — | — | US | disclosed |
| US-8187787-B2 | Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-05-29 | — | — | US | disclosed |
| US-20110065857-A1 | Fluorine-Containing Polymer and Anti-Static Agent Wherein Same is Used | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-03-17 | — | — | US | disclosed |
| EP-2289954-A1 | FLUORINE-CONTAINING POLYMER AND ANTI-STATIC AGENT WHEREIN SAME IS USED | Central Glass Company, Limited (JP) | 2011-03-02 | — | — | EP | disclosed |
| US-20090011199-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2009-01-08 | — | — | US | disclosed |
| EP-0849634-B1 | Radiation sensitive resin composition | JSR CORP (JP) | 2004-03-31 | — | — | EP | disclosed |
| US-6322949-B2 | SULFONIUM COMPOUND AS PHOTOACID GENERATOR | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-11-27 | — | — | US | disclosed |
| US-20010014427-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-08-16 | — | — | US | disclosed |
| US-6187504-B1 | PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION | JSR CORPORATION (JP) | 2001-02-13 | — | — | US | disclosed |
| EP-0849634-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-06-24 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120226070-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same | RTF1, FGFR2, FGFR1 | HSD17B10 3788/4885NR4A1 1993/4885NR4A2 2289/4885 |
| US-20090011199-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same | FGFR2, RTF1, ADGRF1 | HSD17B10 3780/4885NR4A1 2593/4885NR4A2 2856/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.