⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6114 | 0.97 | — | — | |
| SCHEMBL6912035 | 0.93 | — | — | |
| SCHEMBL5969550 | 0.93 | — | — | |
| SCHEMBL1506849 | 0.93 | — | — | |
| SCHEMBL1506863 | 0.93 | — | — | |
| SCHEMBL1506866 | 0.93 | — | — | |
| SCHEMBL1506823 | 0.93 | — | — | |
| SCHEMBL98743 | 0.93 | — | — | |
| SCHEMBL2467242 | 0.93 | — | — | |
| Ammonia Solution, Strong SCHEMBL5978991 | 0.93 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2298714-B1 | COMPOSITION FOR FERROELECTRIC THIN FILM FORMATION, METHOD FOR FERROELECTRIC THIN FILM FORMATION, AND FERROELECTRIC THIN FILM FORMED BY THE METHOD | MITSUBISHI MATERIALS CORP (JP) | 2017-07-05 | — | — | EP | disclosed |
| CN-104446463-B | Composition for ferroelectric thin film formation, method for ferroelectric thin film formation, and ferroelectric thin film formed by the method | 三菱综合材料株式会社 | 2017-04-12 | — | — | CN | disclosed |
| US-9502636-B2 | Composition for ferroelectric thin film formation, method for forming ferroelectric thin film, and ferroelectric thin film formed by the method thereof | MITSUBISHI MATERIALS CORPORATION (JP) | 2016-11-22 | — | — | US | disclosed |
| CN-103360066-B | The formation method of Strong dielectric film formation composition, Strong dielectric film and the Strong dielectric film formed by the method | MITSUBISHI MATERIALS CORP. (JP) | 2015-11-18 | — | — | CN | disclosed |
| US-9005358-B2 | Composition for ferroelectric thin film formation, method for forming ferroelectric thin film, and ferroelectric thin film formed by the method thereof | MITSUBISHI MATERIALS CORPORATION (JP) | 2015-04-14 | — | — | US | disclosed |
| CN-104446463-A | Composition for ferroelectric thin film formation, method for ferroelectric thin film formation, and ferroelectric thin film formed by the method | MITSUBISHI MATERIALS CORP | 2015-03-25 | — | — | CN | disclosed |
| CN-102173795-B | Composition for ferroelectric thin film formation, method for forming ferroelectric thin film, and ferroelectric thin film formed by the method thereof | MITSUBISHI MATERIALS CORP | 2014-12-10 | — | — | CN | disclosed |
| US-20140349834-A1 | COMPOSITION FOR FERROELECTRIC THIN FILM FORMATION, METHOD FOR FORMING FERROELECTRIC THIN FILM, AND FERROELECTRIC THIN FILM FORMED BY THE METHOD THEREOF | MITSUBISHI MATERIALS CORP (JP) | 2014-11-27 | — | — | US | disclosed |
| US-20140349139-A1 | COMPOSITION FOR FERROELECTRIC THIN FILM FORMATION, METHOD FOR FORMING FERROELECTRIC THIN FILM, AND FERROELECTRIC THIN FILM FORMED BY THE METHOD THEREOF | MITSUBISHI MATERIALS CORPORATION (JP) | 2014-11-27 | — | — | US | disclosed |
| US-8859051-B2 | Composition for ferroelectric thin film formation, method for forming ferroelectric thin film and ferroelectric thin film formed by the method thereof | MITSUBISHI MATERIALS CORPORATION (JP) | 2014-10-14 | — | — | US | disclosed |
| CN-102046563-A | Composition for forming ferroelectric thin film, method for forming ferroelectric thin film, and ferroelectric thin film formed by the method | MITSUBISHI MATERIALS CORP | 2011-05-04 | — | — | CN | disclosed |
| US-20110098173-A1 | Composition for ferroelectric thin film formation, method for forming ferroelectric thin film, and ferroelectric thin film formed by the method thereof | STMicroelectronics(Tours) SAS (FR) | 2011-04-28 | — | — | US | disclosed |
| EP-2298714-A1 | COMPOSITION FOR FERROELECTRIC THIN FILM FORMATION, METHOD FOR FERROELECTRIC THIN FILM FORMATION, AND FERROELECTRIC THIN FILM FORMED BY THE METHOD | Mitsubishi Materials Corporation (JP) | 2011-03-23 | — | — | EP | disclosed |
| CN-1427854-A | Method for polymerizing conjugated diolefins (dienes) with catalysts of rare earths in presence of vinyl aromatic solvents | BAYER AG (DE) | 2003-07-02 | — | — | CN | disclosed |
| US-20030050183-A1 | Process for the preparation of diene polymers | BAYER INC. (CA) | 2003-03-13 | — | — | US | disclosed |
| EP-1270612-A1 | Process for the preparation of diene polymers | Bayer Inc. (CA) | 2003-01-02 | — | — | EP | disclosed |
| CN-1351618-A | Method for producing thermoplastic molding materials using rubber solutions | BAYER AG (DE) | 2002-05-29 | — | — | CN | disclosed |
| CN-1350560-A | Method for producing thermoplastic molding material using rubber solutions | BAYER AG (DE) | 2002-05-22 | — | — | CN | disclosed |
| CN-1309674-A | Polymerization of Conjugated Dienes Using Rare Earth Catalysts in the Presence of Vinyl Aromatic Solvents | BAYER AG (DE) | 2001-08-22 | — | — | CN | disclosed |
| CN-1286703-A | Catalyst components for polymerization of dienes, catalyst obtained therefrom, and process for preparation of polydienes using same | MONTELL TECHNOLOGY COMPANY BV (NL) | 2001-03-07 | — | — | CN | disclosed |