Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ERN1 | O75460 | 8/20 | 0.38 |
| ▸ | TYR | P14679 | 2/20 | 0.38 |
| ▸ | TRIM24 | O15164 | 1/20 | 0.38 |
| ▸ | TRIM33 | Q9UPN9 | 1/20 | 0.38 |
| ▸ | TLR2 | O60603 | 1/20 | 0.38 |
| ▸ | TLR1 | Q15399 | 1/20 | 0.38 |
| ▸ | TLR6 | Q9Y2C9 | 1/20 | 0.38 |
| ▸ | SRC | P12931 | 2/20 | 0.33 |
| ▸ | CYSLTR2 | Q9NS75 | 1/20 | 0.33 |
| ▸ | CYSLTR1 | Q9Y271 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | IGF1R | P08069 | 1/20 | 0.33 |
| ▸ | AXL | P30530 | 1/20 | 0.33 |
| ▸ | PTK2 | Q05397 | 1/20 | 0.33 |
| ▸ | AURKB | Q96GD4 | 1/20 | 0.33 |
| ▸ | ALK | Q9UM73 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19124361 | 0.81 | ERN1 (0.39) | ERN1TYRTRIM24TRIM33TLR2 | |
| SCHEMBL15086598 | 0.79 | ERN1 (0.41) | ERN1TYRTRIM24TRIM33TLR2 | |
| SCHEMBL13321963 | 0.78 | KDM4E (0.40) | ERN1TYRTRIM24TRIM33TLR2 | |
| SCHEMBL19123886 | 0.76 | ERN1 (0.38) | ERN1TYRTRIM24TRIM33TLR2 | |
| SCHEMBL2088680 | 0.72 | SLC22A12 (0.38) | TRIM24TRIM33SRCALDH1A1TSHR | |
| SCHEMBL28639767 | 0.72 | ALOX5 (0.41) | ERN1TLR2TLR1TLR6ALDH1A1 | |
| SCHEMBL29933713 | 0.72 | ALOX5 (0.41) | ERN1TLR2TLR1TLR6ALDH1A1 | |
| SCHEMBL452160 | 0.72 | ERN1 (0.48) | ERN1TYRTRIM24TRIM33TLR2 | |
| SCHEMBL3065272 | 0.70 | ERN1 (0.46) | ERN1TYRTRIM24TRIM33TLR2 | |
| SCHEMBL4580995 | 0.69 | ERN1 (0.45) | ERN1TYRTRIM24TRIM33TLR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9046764-B2 | Resist underlayer film composition, method for producing polymer for resist underlayer film, and patterning process using the resist underlayer film composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-02 | — | — | US | disclosed |
| US-20130171569-A1 | RESIST UNDERLAYER FILM COMPOSITION, METHOD FOR PRODUCING POLYMER FOR RESIST UNDERLAYER FILM, AND PATTERNING PROCESS USING THE RESIST UNDERLAYER FILM COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-07-04 | — | — | US | disclosed |