SCHEMBL15086611

SCHEMBL15086611

O=Cc1ccc(Oc2ccc3ccc(O)cc3c2)cc1O

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TYR P14679 3/20 0.56
▸ TRIM24 O15164 1/20 0.56
▸ TRIM33 Q9UPN9 1/20 0.56
▸ KMT2A Q03164 9/20 0.41
▸ MEN1 O00255 8/20 0.41
▸ MAPT P10636 2/20 0.41
▸ CYP1A2 P05177 1/20 0.41
▸ SYNJ2 O15056 1/20 0.41
▸ TTR P02766 1/20 0.41
▸ CYP1A1 P04798 1/20 0.41
▸ BCHE P06276 1/20 0.41
▸ MMP2 P08253 1/20 0.41
▸ ALOX5 P09917 1/20 0.41
▸ PTPN1 P18031 1/20 0.41
▸ PTGS1 P23219 1/20 0.41
▸ CYP1B1 Q16678 1/20 0.41
▸ PTPN22 Q9Y2R2 1/20 0.41
▸ ESR1 P03372 5/20 0.40
▸ ESR2 Q92731 3/20 0.40
▸ CASP3 P42574 2/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10331751 0.84 TYR (0.65) TYRTRIM24TRIM33KMT2AMEN1
SCHEMBL12054413 0.82 CYP1A2 (0.58) KMT2AMEN1MAPTCYP1A2ESR1
SCHEMBL20356051 0.82 CYP1A2 (0.58) KMT2AMEN1MAPTCYP1A2ESR1
SCHEMBL12054411 0.82 CYP1A2 (0.58) KMT2AMEN1MAPTCYP1A2ESR1
SCHEMBL10331753 0.82 ALDH5A1 (0.48) KMT2AMEN1MAPTCYP1A2PTGS1
SCHEMBL10331762 0.82 PTGS1 (0.45) KMT2AMEN1MAPTCYP1A2PTGS1
SCHEMBL6637472 0.79 TRIM24 (0.47) TYRTRIM24TRIM33CYP1A2ESR1
SCHEMBL6742400 0.79 TRIM24 (0.47) TYRTRIM24TRIM33CYP1A2ESR1
SCHEMBL20169579 0.79 CYP1A2 (0.48) KMT2AMEN1MAPTCYP1A2ESR1
SCHEMBL10014247 0.78 ESR1 (0.57) KMT2AMEN1CYP1A2ESR1ESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9046764-B2 Resist underlayer film composition, method for producing polymer for resist underlayer film, and patterning process using the resist underlayer film composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-06-02 — — US disclosed
US-9046764-B2 Resist underlayer film composition, method for producing polymer for resist underlayer film, and patterning process using the resist underlayer film composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-06-02 — — US disclosed
US-20130171569-A1 RESIST UNDERLAYER FILM COMPOSITION, METHOD FOR PRODUCING POLYMER FOR RESIST UNDERLAYER FILM, AND PATTERNING PROCESS USING THE RESIST UNDERLAYER FILM COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-07-04 — — US disclosed
US-20130171569-A1 RESIST UNDERLAYER FILM COMPOSITION, METHOD FOR PRODUCING POLYMER FOR RESIST UNDERLAYER FILM, AND PATTERNING PROCESS USING THE RESIST UNDERLAYER FILM COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-07-04 — — US disclosed
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