SCHEMBL1509290

SCHEMBL1509290

CN(C)c1ccccc1[N+](=O)[O-]

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 1/20 0.54
ALDH1A1 P00352 6/20 0.51
KDM4E B2RXH2 2/20 0.51
HTT P42858 1/20 0.51
HCAR3 P49019 1/20 0.51
TDP1 Q9NUW8 4/20 0.50
GLA P06280 1/20 0.49
POLB P06746 1/20 0.48
SMN1; SMN2 Q16637 2/20 0.47
MAPT P10636 2/20 0.47
L3MBTL1 Q9Y468 2/20 0.47
NPC1 O15118 1/20 0.47
LMNA P02545 1/20 0.47
HPGD P15428 1/20 0.47
MAPK1 P28482 1/20 0.47
RAB9A P51151 1/20 0.47
CA12 O43570 1/20 0.46
CA1 P00915 1/20 0.46
CA2 P00918 1/20 0.46
CA4 P22748 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ammonia Solution, Strong SCHEMBL28268609 0.98 HSD17B10 (0.52) HSD17B10ALDH1A1KDM4EHTTHCAR3
Phosphine SCHEMBL28283987 0.98 HSD17B10 (0.52) HSD17B10ALDH1A1KDM4EHTTHCAR3
SCHEMBL27541691 0.91 ALDH1A1 (0.53) HSD17B10ALDH1A1KDM4EHTTHCAR3
SCHEMBL27651310 0.85 HSD17B10 (0.52) HSD17B10ALDH1A1TDP1POLBSMN1; SMN2
SCHEMBL28055935 0.83 HSD17B10 (0.50) HSD17B10ALDH1A1TDP1POLBSMN1; SMN2
SCHEMBL626777 0.83 HSD17B10 (0.50) HSD17B10ALDH1A1TDP1POLBSMN1; SMN2
SCHEMBL31195404 0.83 HSD17B10 (0.50) HSD17B10ALDH1A1TDP1POLBSMN1; SMN2
SCHEMBL11791524 0.83 HSD17B10 (0.50) HSD17B10ALDH1A1TDP1POLBSMN1; SMN2
SCHEMBL29669355 0.83 HSD17B10 (0.50) HSD17B10ALDH1A1TDP1POLBSMN1; SMN2
SCHEMBL11565380 0.82 HSD17B10 (0.52) HSD17B10ALDH1A1TDP1POLBSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 177 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118184520-A Biphenyl amine compound, preparation method thereof and application thereof in flow battery 中国科学院大连化学物理研究所 2024-06-14 CN claimed
CN-115710251-A Myeloid differentiation factor 88 inhibitor and preparation method and application thereof 杭州医学院 2023-02-24 CN claimed
US-7732534-B2 Polymers functionalized with nitro compounds BRIDGESTONE CORPORATION (JP) 2010-06-08 US claimed
US-7539006-B2 Electrolytic solution for driving electrolytic capacitor and electrolytic capacitor RUBYCON CORPORATION (JP) 2009-05-26 US claimed
CN-100456398-C Electrolyte for driving electrolytic capacitor and electrolytic capacitor RUBYCON CORP (JP) 2009-01-28 CN claimed
US-20080051519-A1 Polymers functionalized with nitro compounds BRIDGESTONE CORPORATION (JP) 2008-02-28 US claimed
US-20080051552-A1 Polymers functionalized with nitro compounds BRIDGESTONE CORPORATION 2008-02-28 US claimed
US-20070029529-A1 Electrolytic solution for driving electrolytic capacitor and electrolytic capacitor KOMATSU AKIHIKO 2007-02-08 US claimed
US-20040245105-A1 Electrolyte solution for driving electrolytic capacitor and electrolytic capacitor RUBYCON CORPORATION (JP) 2004-12-09 US claimed
CN-1529892-A Electrolyte for driving electrolytic capacitor and electrolytic capacitor 如碧空株式会社 2004-09-15 CN claimed
EP-1437749-A1 ELECTROLYTE SOLUTION FOR DRIVING ELECTROLYTIC CAPACITOR AND ELECTROLYTIC CAPACITOR Rubycon Corporation (JP) 2004-07-14 EP claimed
EP-0505890-B1 Process for producing a styrenic polymer IDEMITSU KOSAN CO (JP) 1997-05-28 EP claimed
US-4169853-A HYDROGENATION, CATALYST SELECTIVITY TEXACO DEVELOPMENT CORPORATION (US) 1979-10-02 US claimed
US-4151165-A USING AN AROMATIC NITRO COMPOUND IN OXYGEN-FREE, AQUEOUS ENVIRONMENT ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1979-04-24 US claimed
US-4076537-A Light-sensitive materials containing organo tellurium or selenium compounds and sensitizers FUJI PHOTO FILM CO., LTD. (JA) 1978-02-28 US claimed
US-3992208-A Photo-sensitive etchant and method for forming metal image using same FUJI PHOTO FILM CO., LTD. (JA) 1976-11-16 US claimed
JP-2302329-A None JP disclosed
WO-2025072721-A1 COMPOSITIONS UVAGELESS LLC (US) 2025-04-03 WO disclosed
US-3992208-A Photo-sensitive etchant and method for forming metal image using same FUJI PHOTO FILM CO., LTD. (JA) 1976-11-16 US disclosed
US-3950391-A FUNGICIDES, MITICIDES, OVICIDES ADAMS CHARLES D 1976-04-13 US disclosed