Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MRGPRX4 | Q96LA9 | 1/20 | 0.44 |
| ▸ | TSHR | P16473 | 3/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.41 |
| ▸ | TP53 | P04637 | 3/20 | 0.41 |
| ▸ | MAPT | P10636 | 2/20 | 0.41 |
| ▸ | LMNA | P02545 | 2/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | ABCC3 | O15438 | 1/20 | 0.41 |
| ▸ | PLIN1 | O60240 | 1/20 | 0.41 |
| ▸ | GSTA1 | P08263 | 1/20 | 0.41 |
| ▸ | GSTP1 | P09211 | 1/20 | 0.41 |
| ▸ | HSPD1 | P10809 | 1/20 | 0.41 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.41 |
| ▸ | HTT | P42858 | 1/20 | 0.41 |
| ▸ | RECQL | P46063 | 1/20 | 0.41 |
| ▸ | MAP2K6 | P52564 | 1/20 | 0.41 |
| ▸ | HSPE1 | P61604 | 1/20 | 0.41 |
| ▸ | GSTO1 | P78417 | 1/20 | 0.41 |
| ▸ | PLIN5 | Q00G26 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL150087 | 0.85 | MAPT (0.38) | TSHRALDH1A1TP53MAPTLMNA | |
| SCHEMBL17503451 | 0.83 | HPGD (0.37) | MRGPRX4TSHRKMT2AALDH1A1TP53 | |
| SCHEMBL16535935 | 0.79 | MRGPRX4 (0.38) | MRGPRX4TSHRKMT2AALDH1A1TP53 | |
| SCHEMBL11450814 | 0.73 | TP53 (0.50) | MRGPRX4TSHRALDH1A1TP53LMNA | |
| SCHEMBL3067810 | 0.73 | KMT2A (0.52) | KMT2AALDH1A1LMNAMEN1HTT | |
| SCHEMBL150208 | 0.73 | TDP1 (0.38) | TSHRKMT2AALDH1A1MAPTLMNA | |
| SCHEMBL7228434 | 0.73 | GPR84 (0.47) | MRGPRX4TSHRKMT2AALDH1A1TP53 | |
| SCHEMBL4836971 | 0.72 | GAA (0.55) | TSHRKMT2AALDH1A1MAPTLMNA | |
| SCHEMBL9001338 | 0.72 | MEN1 (0.54) | TSHRKMT2AALDH1A1TP53LMNA | |
| SCHEMBL3050910 | 0.72 | TDP1 (0.61) | MRGPRX4TSHRKMT2AALDH1A1TP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 86 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160122581-A1 | POLYMER COMPOSITIONS AND COATINGS FOR FOOD AND BEVERAGE PACKAGING | THE COCA-COLA COMPANY (US) | 2016-05-05 | — | — | US | claimed |
| EP-2997094-A1 | POLYMER COMPOSITIONS AND COATINGS FOR FOOD AND BEVERAGE PACKAGING | The Coca-Cola Company (US) | 2016-03-23 | — | — | EP | claimed |
| WO-2014186285-A1 | POLYMER COMPOSITIONS AND COATINGS FOR FOOD AND BEVERAGE PACKAGING | THE COCA-COLA COMPANY (US) | 2014-11-20 | — | — | WO | claimed |
| US-10591816-B2 | Photosensitive resin composition, color filter, and liquid crystal display element thereof | CHI MEI CORPORATION (TW) | 2020-03-17 | — | — | US | disclosed |
| US-10266719-B2 | Polymer compositions and coatings for food and beverage packaging | THE COCA-COLA COMPANY (US) | 2019-04-23 | — | — | US | disclosed |
| US-9939568-B2 | Photosensitive resin composition for color filter and application of the same | CHI MEI CORPORATION (TW) | 2018-04-10 | — | — | US | disclosed |
| US-20180004086-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD OF SPACER, PRODUCTION METHOD OF PROTECTION FILM, AND LIQUID CRYSTAL DISPLAY DEVICE | CHI MEI CORPORATION (TW) | 2018-01-04 | — | — | US | disclosed |
| US-20170233601-A1 | ANTI-FOG COATINGS AND METHODS | HONEYWELL INTERNATIONAL INC. | 2017-08-17 | — | — | US | disclosed |
| US-20170235224-A1 | PHOTOSENSITIVE RESIN COMPOSITION, COLOR FILTER, AND LIQUID CRYSTAL DISPLAY ELEMENT THEREOF | CHI MEI CORPORATION (TW) | 2017-08-17 | — | — | US | disclosed |
| US-9676899-B2 | Radiation curable resin composition and rapid three dimensional imaging process using the same | DSM IP ASSETS B.V. (NL) | 2017-06-13 | — | — | US | disclosed |
| US-9557443-B2 | Photosensitive resin composition, black matrix, color filter, and liquid crystal display device | CHI MEI CORPORATION (TW) | 2017-01-31 | — | — | US | disclosed |
| US-20070043138-A1 | Resin composition for photofabrication of three dimensional objects | YAMAMURA TETSUYA | 2007-02-22 | — | — | US | disclosed |
| US-20060194038-A1 | Abrasive articles and methods for making same | SAINT-GOBAIN ABRASIVES, INC. (US) | 2006-08-31 | — | — | US | disclosed |
| US-20060172230-A1 | hazardous waste reduction in stereolithography; nonhazardous: photosensitizer 4-benzoyl-4-methyldiphenyl sulfide, photoacid diffusion inhibitor, an oxetane, and boron containing cationic photoinitiator; fluorinated surfactants or polymers increase curing rate; antimony-free | DSM IP ASSETS B.V. (NL) | 2006-08-03 | — | — | US | disclosed |
| US-20050287470-A1 | Curable compositions and rapid prototyping process using the same | DSM IP ASSETS B.V. (NL) | 2005-12-29 | — | — | US | disclosed |
| US-20050209357-A1 | Flame retardant radiation curable compositions | DSM IP ASSETS B.V. (NL) | 2005-09-22 | — | — | US | disclosed |
| US-20050175930-A1 | Photosensitive resin composition for black matrix | CHI MEI CORPORATION (TW) | 2005-08-11 | — | — | US | disclosed |
| US-20050171255-A1 | Resin composition for photofabrication of three dimensional objects | YAMAMURA TETSUYA (JP) | 2005-08-04 | — | — | US | disclosed |
| US-20050158659-A1 | Photosensitive resin composition for black matrix | CHI MEI CORPORATION (TW) | 2005-07-21 | — | — | US | disclosed |
| US-20050101684-A1 | Curable compositions and rapid prototyping process using the same | YOU XIAORONG (US) | 2005-05-12 | — | — | US | disclosed |