Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 10/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.36 |
| ▸ | MEN1 | O00255 | 3/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.36 |
| ▸ | LMNA | P02545 | 3/20 | 0.36 |
| ▸ | GAA | P10253 | 2/20 | 0.36 |
| ▸ | USP2 | O75604 | 1/20 | 0.36 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.35 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.35 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | NPC1 | O15118 | 1/20 | 0.34 |
| ▸ | RAB9A | P51151 | 1/20 | 0.34 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3787371 | 0.92 | TDP1 (0.36) | TDP1KDM4ESMN1; SMN2ALDH1A1MEN1 | |
| SCHEMBL148282 | 0.85 | TDP1 (0.39) | TDP1KDM4ESMN1; SMN2ALDH1A1MEN1 | |
| SCHEMBL453710 | 0.81 | HTR1B (0.52) | TDP1KDM4ESMN1; SMN2ALDH1A1MEN1 | |
| SCHEMBL452884 | 0.80 | KDM4E (0.53) | KDM4ESMN1; SMN2ALDH1A1MEN1KMT2A | |
| SCHEMBL10457118 | 0.76 | F2 (0.43) | TDP1KDM4ESMN1; SMN2ALDH1A1MEN1 | |
| SCHEMBL11406541 | 0.76 | F2 (0.39) | TDP1KDM4ESMN1; SMN2ALDH1A1MEN1 | |
| SCHEMBL3177108 | 0.75 | THRA (0.38) | KDM4EALDH1A1MEN1KMT2A | |
| SCHEMBL94045 | 0.74 | TDP1 (0.37) | TDP1KDM4ESMN1; SMN2ALDH1A1LMNA | |
| SCHEMBL3187267 | 0.73 | RAB9A (0.49) | KDM4ESMN1; SMN2ALDH1A1MEN1KMT2A | |
| SCHEMBL150944 | 0.73 | MRGPRX4 (0.44) | TDP1KDM4ESMN1; SMN2ALDH1A1MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 88 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160122581-A1 | POLYMER COMPOSITIONS AND COATINGS FOR FOOD AND BEVERAGE PACKAGING | THE COCA-COLA COMPANY (US) | 2016-05-05 | — | — | US | claimed |
| US-10591816-B2 | Photosensitive resin composition, color filter, and liquid crystal display element thereof | CHI MEI CORPORATION (TW) | 2020-03-17 | — | — | US | disclosed |
| US-10266719-B2 | Polymer compositions and coatings for food and beverage packaging | THE COCA-COLA COMPANY (US) | 2019-04-23 | — | — | US | disclosed |
| EP-3206872-B1 | ANTI-FOG COATINGS AND METHODS | HONEYWELL INT INC (US) | 2019-01-09 | — | — | EP | disclosed |
| US-9939568-B2 | Photosensitive resin composition for color filter and application of the same | CHI MEI CORPORATION (TW) | 2018-04-10 | — | — | US | disclosed |
| US-20180004086-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD OF SPACER, PRODUCTION METHOD OF PROTECTION FILM, AND LIQUID CRYSTAL DISPLAY DEVICE | CHI MEI CORPORATION (TW) | 2018-01-04 | — | — | US | disclosed |
| US-20170235224-A1 | PHOTOSENSITIVE RESIN COMPOSITION, COLOR FILTER, AND LIQUID CRYSTAL DISPLAY ELEMENT THEREOF | CHI MEI CORPORATION (TW) | 2017-08-17 | — | — | US | disclosed |
| US-20170233601-A1 | ANTI-FOG COATINGS AND METHODS | HONEYWELL INTERNATIONAL INC. | 2017-08-17 | — | — | US | disclosed |
| US-9676899-B2 | Radiation curable resin composition and rapid three dimensional imaging process using the same | DSM IP ASSETS B.V. (NL) | 2017-06-13 | — | — | US | disclosed |
| US-9557443-B2 | Photosensitive resin composition, black matrix, color filter, and liquid crystal display device | CHI MEI CORPORATION (TW) | 2017-01-31 | — | — | US | disclosed |
| US-20070232713-A1 | Radiation Curable Liquid Resin Composition for Optical Three-Dimensional Molding and Optical Molded Article Obtained by Photocuring Same | JSR CORPORATION (JP) | 2007-10-04 | — | — | US | disclosed |
| US-20070043138-A1 | Resin composition for photofabrication of three dimensional objects | YAMAMURA TETSUYA | 2007-02-22 | — | — | US | disclosed |
| US-20060194038-A1 | Abrasive articles and methods for making same | SAINT-GOBAIN ABRASIVES, INC. (US) | 2006-08-31 | — | — | US | disclosed |
| US-20060172230-A1 | hazardous waste reduction in stereolithography; nonhazardous: photosensitizer 4-benzoyl-4-methyldiphenyl sulfide, photoacid diffusion inhibitor, an oxetane, and boron containing cationic photoinitiator; fluorinated surfactants or polymers increase curing rate; antimony-free | DSM IP ASSETS B.V. (NL) | 2006-08-03 | — | — | US | disclosed |
| US-20050287470-A1 | Curable compositions and rapid prototyping process using the same | DSM IP ASSETS B.V. (NL) | 2005-12-29 | — | — | US | disclosed |
| US-20050209357-A1 | Flame retardant radiation curable compositions | DSM IP ASSETS B.V. (NL) | 2005-09-22 | — | — | US | disclosed |
| US-20050175930-A1 | Photosensitive resin composition for black matrix | CHI MEI CORPORATION (TW) | 2005-08-11 | — | — | US | disclosed |
| US-20050171255-A1 | Resin composition for photofabrication of three dimensional objects | YAMAMURA TETSUYA (JP) | 2005-08-04 | — | — | US | disclosed |
| US-20050158659-A1 | Photosensitive resin composition for black matrix | CHI MEI CORPORATION (TW) | 2005-07-21 | — | — | US | disclosed |
| US-20050101684-A1 | Curable compositions and rapid prototyping process using the same | YOU XIAORONG (US) | 2005-05-12 | — | — | US | disclosed |