SCHEMBL15096009

SCHEMBL15096009

CCCCC(C)(OC(=O)C(C)(C)CC)C12CC3CC(CC1C3)C2

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 10/20 0.33
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL47388 0.85 EPHX2 (0.35) EPHX2ALDH1A1
SCHEMBL47385 0.81 KMT2A (0.33) EPHX2ALDH1A1
SCHEMBL19753662 0.77 MEN1 (0.33) EPHX2ALDH1A1
SCHEMBL119887 0.75 KMT2A (0.34) EPHX2ALDH1A1
SCHEMBL18802878 0.71 MEN1 (0.33) EPHX2ALDH1A1
SCHEMBL47390 0.70 KMT2A (0.35) EPHX2ALDH1A1
SCHEMBL13059593 0.69 MEN1 (0.31) ALDH1A1
SCHEMBL13932749 0.69 EPHX2 (0.34) EPHX2
SCHEMBL10148640 0.69 KMT2A (0.34) EPHX2ALDH1A1
SCHEMBL2740754 0.69 KMT2A (0.34) EPHX2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130177850-A1 POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSURE AND A METHOD OF FORMING THE PATTERN USING THE SAME FUJIFILM CORPORATION (JP) 2013-07-11 US disclosed