Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 2/20 | 0.31 |
| ▸ | MMP8 | P22894 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14548544 | 0.87 | TSHR (0.32) | TSHRLMNAMMP8 | |
| SCHEMBL15214698 | 0.86 | MAPT (0.33) | — | |
| SCHEMBL15214700 | 0.84 | — | — | |
| SCHEMBL12336379 | 0.81 | CA1 (0.36) | LMNAMMP8 | |
| SCHEMBL13380467 | 0.81 | MMP8 (0.35) | TSHRLMNAMMP8 | |
| SCHEMBL13265367 | 0.80 | — | — | |
| SCHEMBL13180970 | 0.79 | — | — | |
| SCHEMBL13181070 | 0.77 | — | — | |
| SCHEMBL15214701 | 0.76 | ALDH1A1 (0.41) | TSHRLMNA | |
| SCHEMBL13527628 | 0.76 | HTT (0.44) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9213237-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2015-12-15 | — | — | US | disclosed |
| US-20140308605-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2014-10-16 | — | — | US | disclosed |
| US-8518629-B2 | Resist composition for immersion exposure and method of forming resist pattern using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-08-27 | — | — | US | disclosed |