SCHEMBL13380467

SCHEMBL13380467

CCOC(=O)C(CC(C)(C)CC)C(C)(C)CC

nearest known ligand 0.35

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
MMP8 P22894 1/20 0.35
ALDH1A1 P00352 4/20 0.34
LMNA P02545 1/20 0.33
HSD17B10 Q99714 1/20 0.33
ALOX15 P16050 2/20 0.32
MGAM O43451 1/20 0.32
GAA P10253 1/20 0.32
SI P14410 1/20 0.32
MGAM2 Q2M2H8 1/20 0.32
SOAT1 P35610 1/20 0.32
CPB2 Q96IY4 1/20 0.31
TRPA1 O75762 1/20 0.30
CYP3A4 P08684 1/20 0.30
TSHR P16473 1/20 0.30
TDP1 Q9NUW8 1/20 0.30
CYP4F2 P78329 2/20 0.30
CYP4A11 Q02928 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15060853 0.89 LMNA (0.34) MMP8ALDH1A1LMNAHSD17B10ALOX15
SCHEMBL16638380 0.88 GAA (0.35) MMP8ALDH1A1MGAMGAASI
SCHEMBL12524316 0.86 MMP8 (0.36) MMP8ALDH1A1LMNAHSD17B10ALOX15
SCHEMBL15259170 0.86 MMP8 (0.36) MMP8ALDH1A1LMNAHSD17B10ALOX15
SCHEMBL14354544 0.85 MMP8 (0.35) MMP8ALDH1A1LMNAHSD17B10ALOX15
SCHEMBL12336379 0.85 CA1 (0.36) MMP8LMNA
SCHEMBL22135559 0.83 MMP8 (0.38) MMP8ALDH1A1LMNAHSD17B10ALOX15
SCHEMBL13265367 0.83
SCHEMBL13527628 0.82 HTT (0.44)
SCHEMBL15214701 0.82 ALDH1A1 (0.41) ALDH1A1LMNACYP3A4TSHRTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3154553-B1 ENTERIC ELASTOMERS MASSACHUSETTS INST TECHNOLOGY (US) 2020-08-05 EP disclosed
US-20170088755-A1 PELLICLE INCLUDING A WATER-SOLUBLE ADHESIVE AND PHOTOMASK ASSEMBLY INCLUDING THE PELLICLE SAMSUNG ELECTRONICS CO., LTD. (KR) 2017-03-30 US disclosed
US-9568824-B2 Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith FUJIFILM CORPORATION (JP) 2017-02-14 US disclosed
US-7704657-B2 Electrophotographic photosensitive member, method of manufacturing electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus CANON KABUSHIKI KAISHA (JP) 2010-04-27 US disclosed
US-20090180800-A1 ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, METHOD OF MANUFACTURING ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC APPARATUS CANON KABUSHIKI KAISHA (JP) 2009-07-16 US disclosed
US-20070148593-A1 Polymerizable composition and planographic printing plate precursor using the same FUJIFILM CORPORATION 2007-06-28 US disclosed