Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10067051 | 0.90 | CYP4F2 (0.35) | CYP4F2CYP4A11 | |
| SCHEMBL12157326 | 0.84 | CYP4F2 (0.32) | CYP4F2CYP4A11 | |
| SCHEMBL683677 | 0.83 | CYP4F2 (0.32) | CYP4F2CYP4A11 | |
| SCHEMBL2740709 | 0.81 | ALDH1A1 (0.36) | CYP4F2CYP4A11 | |
| SCHEMBL15281556 | 0.81 | CYP4F2 (0.31) | CYP4F2CYP4A11 | |
| SCHEMBL15275703 | 0.81 | — | — | |
| SCHEMBL14649718 | 0.81 | CYP4F2 (0.32) | CYP4F2CYP4A11 | |
| SCHEMBL9239574 | 0.80 | CYP4F2 (0.38) | CYP4F2CYP4A11 | |
| SCHEMBL15432458 | 0.80 | CYP4F2 (0.38) | CYP4F2CYP4A11 | |
| SCHEMBL16706071 | 0.80 | NAAA (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8957160-B2 | Preparation of polymer, resulting polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-02-17 | — | — | US | disclosed |
| US-8957160-B2 | Preparation of polymer, resulting polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-02-17 | — | — | US | disclosed |
| US-8859194-B2 | Polymer compound, and resist-protecting film composition including same for a liquid immersion exposure process | DONGJIN SEMICHEM CO., LTD. (KR) | 2014-10-14 | — | — | US | disclosed |
| US-8859194-B2 | Polymer compound, and resist-protecting film composition including same for a liquid immersion exposure process | DONGJIN SEMICHEM CO., LTD. (KR) | 2014-10-14 | — | — | US | disclosed |
| US-20130252170-A1 | Polymer Compound, And Resist-Protecting Film Composition Including Same For A Liquid Immersion Exposure Process | DONGJIN SEMICHEM CO., LTD. (KR) | 2013-09-26 | — | — | US | disclosed |
| US-20130252170-A1 | Polymer Compound, And Resist-Protecting Film Composition Including Same For A Liquid Immersion Exposure Process | DONGJIN SEMICHEM CO., LTD. (KR) | 2013-09-26 | — | — | US | disclosed |
| US-20130224659-A1 | POLYMER, MAKING METHOD, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-29 | — | — | US | disclosed |
| US-20130224660-A1 | PREPARATION OF POLYMER, RESULTING POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-29 | — | — | US | disclosed |
| US-20130224659-A1 | POLYMER, MAKING METHOD, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-29 | — | — | US | disclosed |
| US-20130224660-A1 | PREPARATION OF POLYMER, RESULTING POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-29 | — | — | US | disclosed |