SCHEMBL15216276

SCHEMBL15216276

CCC(C)(C)C(=O)Oc1ccc(OCC(=O)OC(C)C(F)(F)S(=O)(=O)O)cc1

nearest known ligand 0.38

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
MAPT P10636 1/20 0.38
AOC2 O75106 2/20 0.37
ELANE P08246 3/20 0.37
GAA P10253 2/20 0.36
NPSR1 Q6W5P4 1/20 0.36
POLB P06746 2/20 0.35
LMNA P02545 1/20 0.34
PSEN1 P49768 1/20 0.34
PSEN2 P49810 1/20 0.34
APH1B Q8WW43 1/20 0.34
NCSTN Q92542 1/20 0.34
APH1A Q96BI3 1/20 0.34
PSENEN Q9NZ42 1/20 0.34
MAOB P27338 2/20 0.34
ALDH1A1 P00352 1/20 0.33
CYP2C9 P11712 1/20 0.33
CYP2C19 P33261 1/20 0.33
PTPN1 P18031 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2608025 0.87 MAPT (0.42) MAPTELANEGAANPSR1POLB
SCHEMBL15216265 0.84 ELANE (0.43) MAPTELANEALDH1A1
SCHEMBL10330473 0.81 ELANE (0.41) MAPTELANEGAANPSR1POLB
SCHEMBL15216272 0.78 ELANE (0.37) ELANE
SCHEMBL682253 0.76
SCHEMBL12357119 0.75 ELANE (0.47) MAPTELANEPOLB
SCHEMBL15216888 0.75 ELANE (0.43) ELANE
SCHEMBL14649818 0.75 ELANE (0.42) ELANEGAANPSR1LMNAPSEN1
SCHEMBL2608021 0.75 ELANE (0.45) MAPTELANEGAANPSR1LMNA
SCHEMBL10175753 0.74 ELANE (0.46) ELANEGAANPSR1LMNAPSEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8957160-B2 Preparation of polymer, resulting polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-02-17 US disclosed
US-20130224659-A1 POLYMER, MAKING METHOD, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-29 US disclosed
US-20130224660-A1 PREPARATION OF POLYMER, RESULTING POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-29 US disclosed