SCHEMBL15219616

SCHEMBL15219616

CCC(CC)(CF)C(=O)OC(C(C)C)C(C)C

nearest known ligand 0.32

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
CTSK P43235 1/20 0.32
CYP4F2 P78329 1/20 0.30
CYP4A11 Q02928 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12296080 0.90 CTSK (0.32) CTSKCYP4F2CYP4A11
SCHEMBL12325995 0.90 CTSK (0.32) CTSKCYP4F2CYP4A11
SCHEMBL12065974 0.88
SCHEMBL111863 0.74 CTSK (0.33) CTSK
SCHEMBL111939 0.74 CTSK (0.34) CTSK
SCHEMBL108733 0.72 CTSK (0.31) CTSK
SCHEMBL13829309 0.72 CTSK (0.31) CTSK
SCHEMBL9469425 0.71 CYP4F2 (0.33) CYP4F2CYP4A11
SCHEMBL6048743 0.71 CTSK (0.33) CTSK
SCHEMBL6894109 0.68 PRKCA (0.42) CTSK

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2013125733-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2013-08-29 WO disclosed