SCHEMBL15219617

SCHEMBL15219617

CC(C)C[C@](C)(C(=O)OC(C(F)(F)F)C(F)(F)F)C(C)C

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
MMP8 P22894 1/20 0.33
MGLL Q99685 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10228185 1.00 MMP8 (0.33) MMP8MGLL
SCHEMBL18487376 0.89 MMP8 (0.33) MMP8
SCHEMBL20409097 0.89 MMP8 (0.33) MMP8
SCHEMBL18408861 0.88 MMP8 (0.33) MMP8MGLL
SCHEMBL15189434 0.87 MMP8 (0.34) MMP8
SCHEMBL20402693 0.84 MMP8 (0.32) MMP8
SCHEMBL14905847 0.84
SCHEMBL18643695 0.82
SCHEMBL13966977 0.82
SCHEMBL20409147 0.82 MMP8 (0.31) MMP8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2014142360-A1 METHOD OF FORMING PATTERN, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM, PROCESS FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2014-09-18 WO disclosed
WO-2013125733-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2013-08-29 WO disclosed