SCHEMBL20409147

SCHEMBL20409147

CC(C)CC(C)(C(=O)OCCC(=O)OC(C(F)(F)F)C(F)(F)F)C(C)C

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
MMP8 P22894 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20402693 0.86 MMP8 (0.32) MMP8
SCHEMBL13181043 0.83
SCHEMBL15219617 0.82 MMP8 (0.33) MMP8
SCHEMBL10228185 0.82 MMP8 (0.33) MMP8
SCHEMBL20408980 0.81
SCHEMBL18487376 0.78 MMP8 (0.33) MMP8
SCHEMBL20409097 0.78 MMP8 (0.33) MMP8
SCHEMBL18560733 0.78 MMP8 (0.41) MMP8
SCHEMBL13153217 0.77
SCHEMBL29332044 0.76 MMP8 (0.35) MMP8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10606174-B2 Resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2020-03-31 US disclosed
US-20180210338-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2018-07-26 US disclosed