SCHEMBL20409097

SCHEMBL20409097

CC(C)CC(C)(C(=O)OC(C)C(=O)OC(C(F)(F)F)C(F)(F)F)C(C)C

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
MMP8 P22894 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10228185 0.89 MMP8 (0.33) MMP8
SCHEMBL15219617 0.89 MMP8 (0.33) MMP8
SCHEMBL18487376 0.88 MMP8 (0.33) MMP8
SCHEMBL19967100 0.84 MMP8 (0.34) MMP8
SCHEMBL15160028 0.81
SCHEMBL20402693 0.81 MMP8 (0.32) MMP8
SCHEMBL15189434 0.80 MMP8 (0.34) MMP8
SCHEMBL20409147 0.78 MMP8 (0.31) MMP8
SCHEMBL18408861 0.78 MMP8 (0.33) MMP8
SCHEMBL13153230 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10606174-B2 Resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2020-03-31 US disclosed
US-20180210338-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2018-07-26 US disclosed