SCHEMBL15280969

SCHEMBL15280969

CCC(C)(C)C(=O)OC12CC3CC(CC(COC(=O)CC(F)(F)S(=O)(=O)O)(C3)C1)C2

nearest known ligand 0.35

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
SCN9A Q15858 3/20 0.34
ALDH1A1 P00352 1/20 0.32
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12157324 0.87 SCN9A (0.35) SCN9AALDH1A1MEN1KMT2AL3MBTL1
SCHEMBL27273344 0.85 ALDH1A1 (0.34) SCN9AALDH1A1MEN1KMT2AL3MBTL1
SCHEMBL15280968 0.83 ALDH1A1 (0.36) SCN9AALDH1A1MEN1KMT2AL3MBTL1
SCHEMBL24400985 0.83 SCN9A (0.32) SCN9AALDH1A1
SCHEMBL17243902 0.80 ALDH1A1 (0.39) SCN9AALDH1A1MEN1KMT2AL3MBTL1
SCHEMBL15222943 0.79 DPP8 (0.32) SCN9A
SCHEMBL12309602 0.79 ALDH1A1 (0.36) SCN9AALDH1A1MEN1KMT2AL3MBTL1
SCHEMBL16605510 0.78 SCN9A (0.38) SCN9AALDH1A1MEN1KMT2AL3MBTL1
SCHEMBL16605508 0.78 ALDH1A1 (0.43) SCN9AALDH1A1MEN1KMT2AL3MBTL1
SCHEMBL10135332 0.78 NPSR1 (0.36) ALDH1A1MEN1KMT2AL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8859194-B2 Polymer compound, and resist-protecting film composition including same for a liquid immersion exposure process DONGJIN SEMICHEM CO., LTD. (KR) 2014-10-14 US disclosed
US-8859194-B2 Polymer compound, and resist-protecting film composition including same for a liquid immersion exposure process DONGJIN SEMICHEM CO., LTD. (KR) 2014-10-14 US disclosed
US-20130252170-A1 Polymer Compound, And Resist-Protecting Film Composition Including Same For A Liquid Immersion Exposure Process DONGJIN SEMICHEM CO., LTD. (KR) 2013-09-26 US disclosed
US-20130252170-A1 Polymer Compound, And Resist-Protecting Film Composition Including Same For A Liquid Immersion Exposure Process DONGJIN SEMICHEM CO., LTD. (KR) 2013-09-26 US disclosed