SCHEMBL15280968

SCHEMBL15280968

CCC(C)(C)C(=O)OC12CC3CC(CC(COC(=O)C(C)(F)F)(C3)C1)C2

nearest known ligand 0.40

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.36
MEN1 O00255 2/20 0.35
KMT2A Q03164 2/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
SCN9A Q15858 2/20 0.34
CYP17A1 P05093 1/20 0.33
CYP19A1 P11511 1/20 0.33
DPP8 Q6V1X1 1/20 0.31
DPP9 Q86TI2 1/20 0.31
THRB P10828 1/20 0.31
GAA P10253 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18232691 0.90 ALDH1A1 (0.33) ALDH1A1MEN1KMT2AL3MBTL1SCN9A
SCHEMBL13450020 0.89 SCN9A (0.41) ALDH1A1MEN1KMT2AL3MBTL1SCN9A
SCHEMBL12157324 0.88 SCN9A (0.35) ALDH1A1MEN1KMT2AL3MBTL1SCN9A
SCHEMBL17243902 0.87 ALDH1A1 (0.39) ALDH1A1MEN1KMT2AL3MBTL1SCN9A
SCHEMBL13450018 0.87 SCN9A (0.35) ALDH1A1MEN1KMT2AL3MBTL1SCN9A
SCHEMBL12309602 0.86 ALDH1A1 (0.36) ALDH1A1MEN1KMT2AL3MBTL1SCN9A
SCHEMBL13450028 0.85 SCN9A (0.34) ALDH1A1MEN1KMT2AL3MBTL1SCN9A
SCHEMBL18195521 0.83 PKM (0.42) ALDH1A1MEN1KMT2AL3MBTL1CYP17A1
SCHEMBL10447923 0.83 ALDH1A1 (0.33) ALDH1A1MEN1KMT2AL3MBTL1SCN9A
SCHEMBL15280969 0.83 SCN9A (0.34) ALDH1A1MEN1KMT2AL3MBTL1SCN9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230305391-A1 SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-09-28 US disclosed
US-20230305395-A1 SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-09-28 US disclosed
US-20230161256-A1 SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-05-25 US disclosed
US-20230146890-A1 SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-05-11 US disclosed
US-8859194-B2 Polymer compound, and resist-protecting film composition including same for a liquid immersion exposure process DONGJIN SEMICHEM CO., LTD. (KR) 2014-10-14 US disclosed
US-20130252170-A1 Polymer Compound, And Resist-Protecting Film Composition Including Same For A Liquid Immersion Exposure Process DONGJIN SEMICHEM CO., LTD. (KR) 2013-09-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230305391-A1 SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN RER1, H1-0, BET1 ALDH1A1 1692/4885MEN1 1440/4885KMT2A 521/4885
US-20230146890-A1 SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN RER1, ASIC1, REN ALDH1A1 1360/4885MEN1 1918/4885KMT2A 1882/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.