SCHEMBL15326153

SCHEMBL15326153

CCC1(OC(=O)C(C)(C)CC(C)C)CCCC1

nearest known ligand 0.34

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
MMP8 P22894 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19808247 0.98 MMP8 (0.33) MMP8
SCHEMBL24262255 0.87 MMP8 (0.34) MMP8
SCHEMBL14838468 0.86 MMP8 (0.33) MMP8
SCHEMBL10248263 0.86 MMP8 (0.33) MMP8
SCHEMBL13759975 0.84 MMP8 (0.33) MMP8
SCHEMBL13557289 0.84 MMP8 (0.33) MMP8
SCHEMBL18698633 0.84 MMP8 (0.33) MMP8
SCHEMBL14996759 0.84 MMP8 (0.33) MMP8
SCHEMBL47494 0.83 HMGCR (0.32)
SCHEMBL21162912 0.82 MMP8 (0.31) MMP8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210200089-A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND ACID DIFFUSION-CONTROLLING AGENT TOKYO OHKA KOGYO CO., LTD. (JP) 2021-07-01 US disclosed
US-20200183275-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2020-06-11 US disclosed
WO-2013154210-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, ELECTRONIC DEVICE MANUFACTURING METHOD USING THE SAME, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2013-10-17 WO disclosed