Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MMP8 | P22894 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24262255 | 0.91 | MMP8 (0.34) | MMP8 | |
| SCHEMBL14996759 | 0.88 | MMP8 (0.33) | MMP8 | |
| SCHEMBL23331041 | 0.86 | MMP8 (0.31) | MMP8 | |
| SCHEMBL15326153 | 0.82 | MMP8 (0.34) | MMP8 | |
| SCHEMBL10248263 | 0.81 | MMP8 (0.33) | MMP8 | |
| SCHEMBL19808247 | 0.81 | MMP8 (0.33) | MMP8 | |
| SCHEMBL14838468 | 0.81 | MMP8 (0.33) | MMP8 | |
| SCHEMBL18698633 | 0.79 | MMP8 (0.33) | MMP8 | |
| SCHEMBL13557289 | 0.79 | MMP8 (0.33) | MMP8 | |
| SCHEMBL13759975 | 0.79 | MMP8 (0.33) | MMP8 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230135117-A1 | SOLUTION, SOLUTION STORAGE BODY, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2023-05-04 | — | — | US | disclosed |
| US-11573489-B2 | Solution, solution storage body, actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and manufacturing method of semiconductor device | FUJIFILM CORPORATION (JP) | 2023-02-07 | — | — | US | disclosed |
| US-20190196327-A1 | SOLUTION, SOLUTION STORAGE BODY, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2019-06-27 | — | — | US | disclosed |