Known targets — ChEMBL curated mechanism
GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BHMGCRMMP1MMP13MMP7MMP8PTGS1PTGS2ileSpolrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Fluoride Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride Ion SCHEMBL125133 | 0.82 | — | — | |
| Fluoride Ion SCHEMBL7060264 | 0.82 | — | — | |
| Fluoride Ion SCHEMBL1634173 | 0.82 | — | — | |
| Fluoride Ion SCHEMBL10339061 | 0.82 | CA4 (0.50) | — | |
| Fluoride Ion SCHEMBL29859 | 0.82 | — | — | |
| Fluoride Ion SCHEMBL23880276 | 0.67 | — | — | |
| Fluoride Ion SCHEMBL2240366 | 0.67 | — | — | |
| Fluoride Ion SCHEMBL11572159 | 0.67 | — | — | |
| Fluoride Ion SCHEMBL7100054 | 0.67 | — | — | |
| Fluoride Ion SCHEMBL438334 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20110063592-A1 | FLUORESCENT FILM, METHOD OF FORMING FLUORESCENT FILM, MULTILAYER DIELECTRIC FILM, OPTICAL ELEMENT, OPTICAL SYSTEM, IMAGING UNIT, OPTICAL PROPERTY MEASURING APPARATUS, METHOD OF MEASURING OPTICAL PROPERTY, EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTURING DEVICE | NIKON CORPORATION (JP) | 2011-03-17 | — | — | US | claimed |
| CN-111961886-A | Preparation method of high-purity rare earth metal scandium and scandium sputtering target material | 湖南稀土金属材料研究院 | 2020-11-20 | — | — | CN | disclosed |
| US-20190006709-A1 | FLUORIDE SHUTTLE SECONDARY BATTERY | PANASONIC CORPORATION (JP) | 2019-01-03 | — | — | US | disclosed |
| US-20110063592-A1 | FLUORESCENT FILM, METHOD OF FORMING FLUORESCENT FILM, MULTILAYER DIELECTRIC FILM, OPTICAL ELEMENT, OPTICAL SYSTEM, IMAGING UNIT, OPTICAL PROPERTY MEASURING APPARATUS, METHOD OF MEASURING OPTICAL PROPERTY, EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTURING DEVICE | NIKON CORPORATION (JP) | 2011-03-17 | — | — | US | disclosed |