Tromethamine

Tromethamine

SCHEMBL1532733

CN(C)[SiH3].NC(CO)(CO)CO

nearest known ligand 0.62

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

DHFRGARTPTGFRPTGIRPTGS1PTGS2TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8envmurAthyA

The experimentally established mechanism targets of Tromethamine. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.62
LMNA P02545 1/20 0.62
KMT2A Q03164 1/20 0.62

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Tromethamine SCHEMBL1759319 0.87 MEN1 (0.71) MEN1LMNAKMT2A
Tromethamine SCHEMBL8497866 0.84 MEN1 (0.67) MEN1LMNAKMT2A
Tromethamine SCHEMBL29175316 0.84 MEN1 (0.67) MEN1LMNAKMT2A
Tromethamine SCHEMBL19988134 0.82 MEN1 (0.56) MEN1LMNAKMT2A
Tromethamine SCHEMBL3433733 0.81 MEN1 (0.62) MEN1LMNAKMT2A
Tromethamine SCHEMBL5655709 0.81 MEN1 (0.62) MEN1LMNAKMT2A
Tromethamine SCHEMBL9443897 0.81 MEN1 (0.62) MEN1LMNAKMT2A
Tromethamine SCHEMBL8772229 0.81 MEN1 (0.62) MEN1LMNAKMT2A
Tromethamine SCHEMBL1278460 0.81 MEN1 (0.62) MEN1LMNAKMT2A
Tromethamine SCHEMBL7193959 0.79 MEN1 (0.83) MEN1LMNAKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12400840-B2 Substrate processing apparatus, substrate holder, and method of manufacturing semiconductor device Kokusai Electric Corporation (JP) 2025-08-26 US disclosed
US-20230187188-A1 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE HOLDER, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE Kokusai Electric Corporation (JP) 2023-06-15 US disclosed
US-11359285-B2 Substrate processing apparatus, heater and method of manufacturing semiconductor device Kokusai Electric Corporation (JP) 2022-06-14 US disclosed
US-20200173024-A1 Substrate Processing Apparatus, Heater and Method of Manufacturing Semiconductor Device KOKUSAI ELECTRIC CORP (JP) 2020-06-04 US disclosed
US-10597780-B2 Substrate processing apparatus, heater and method of manufacturing semiconductor device Kokusai Electric Corporation (JP) 2020-03-24 US disclosed
US-9885114-B2 Film forming apparatus TOKYO ELECTRON LIMITED (JP) 2018-02-06 US disclosed
US-20170335458-A1 Substrate Processing Apparatus, Heater and Method of Manufacturing Semiconductor Device Kokusai Electric Corporation (JP) 2017-11-23 US disclosed
US-20150267298-A1 FILM FORMING APPARATUS TOKYO ELECTRON LIMITED (JP) 2015-09-24 US disclosed
US-20110064958-A1 WEATHER-RESISTANCE RESIN BASE MATERIAL AND OPTICAL ELEMENT KONICA MINOLTA HOLDINGS, INC. (JP) 2011-03-17 US disclosed
US-4789564-A Hydridoaminosilane treatment for rendering surfaces water-repellent UNION CARBIDE CORPORATION (US) 1988-12-06 US disclosed