SCHEMBL15410255

SCHEMBL15410255

CCCCc1cc(CCCC)cc(C2=C(C)C(C)=C(C)C2(C)[SiH](c2ccccc2)c2ccccc2)c1

nearest known ligand 0.38

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 2/20 0.35
PSMB5 P28074 1/20 0.33
SKP2 Q13309 1/20 0.33
NPC1 O15118 1/20 0.32
HPGD P15428 1/20 0.32
MAPK1 P28482 1/20 0.32
HTT P42858 1/20 0.32
RAB9A P51151 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
RARB P10826 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10317170 0.89 HSD11B1 (0.44) HSD11B1PSMB5SKP2HPGDRARB
SCHEMBL15411093 0.87 RXRA (0.35)
SCHEMBL15409957 0.86 NPC1 (0.33) SKP2NPC1HPGDMAPK1HTT
SCHEMBL15410245 0.81 PTGS2 (0.34)
SCHEMBL11897196 0.78 RXRA (0.31)
SCHEMBL15410784 0.78
SCHEMBL15409777 0.78 RARB (0.37) HSD11B1SKP2NPC1HPGDRAB9A
SCHEMBL12816802 0.77 HSD11B1 (0.31) HSD11B1
Hydrochloric Acid SCHEMBL15411321 0.76 HSD11B1 (0.32) HSD11B1PSMB5
SCHEMBL15411103 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8937195-B2 Method for producing the transition metal complex, catalyst for trimerization, method for producing 1-hexene, method for producing the substituted cyclopentadiene compound (1) SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2015-01-20 US disclosed
US-20140018564-A1 METHOD FOR PRODUCING THE TRANSITION METAL COMPLEX, CATALYST FOR TRIMERIZATION, METHOD FOR PRODUCING 1-HEXENE, METHOD FOR PRODUCING THE SUBSTITUTED CYCLOPENTADIENE COMPOUND (1) SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-01-16 US disclosed