Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PGK1 | P00558 | 6/20 | 0.55 |
| ▸ | PGK2 | P07205 | 6/20 | 0.55 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
| ▸ | FDPS | P14324 | 1/20 | 0.30 |
| ▸ | LPAR1 | Q92633 | 1/20 | 0.30 |
| ▸ | LPAR3 | Q9UBY5 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL442637 | 0.91 | PGK1 (0.52) | PGK1PGK2PTPN1THRBLMNA | |
| SCHEMBL2944720 | 0.88 | PGK1 (0.50) | PGK1PGK2PTPN1THRBLMNA | |
| SCHEMBL234703 | 0.88 | PGK1 (0.50) | PGK1PGK2PTPN1THRBLMNA | |
| SCHEMBL20558504 | 0.88 | PGK1 (0.50) | PGK1PGK2PTPN1THRBLMNA | |
| SCHEMBL2783614 | 0.88 | PGK1 (0.50) | PGK1PGK2PTPN1THRBLMNA | |
| SCHEMBL20558582 | 0.88 | PGK1 (0.50) | PGK1PGK2PTPN1THRBLMNA | |
| SCHEMBL11859908 | 0.88 | PGK1 (0.50) | PGK1PGK2PTPN1THRBLMNA | |
| SCHEMBL2681324 | 0.88 | PGK1 (0.50) | PGK1PGK2PTPN1THRBLMNA | |
| SCHEMBL12762079 | 0.87 | PGK1 (0.61) | PGK1PGK2PTPN1LMNAKDM4E | |
| SCHEMBL12762109 | 0.87 | PGK1 (0.61) | PGK1PGK2PTPN1LMNAKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108369907-B | Liquid composition and method for surface treatment of semiconductor substrate using same | 三菱瓦斯化学株式会社 | 2022-09-20 | — | — | CN | claimed |
| US-11094526-B2 | Liquid composition for imparting alcohol-repellency to semiconductor substrate material, and method for treating surface of semiconductor substrate using said liquid composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-08-17 | — | — | US | claimed |
| EP-3404700-B1 | LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2020-05-13 | — | — | EP | claimed |
| US-20190019672-A1 | LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2019-01-17 | — | — | US | claimed |
| EP-3404700-A1 | LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-11-21 | — | — | EP | claimed |
| CN-108369907-B | Liquid composition and method for surface treatment of semiconductor substrate using same | 三菱瓦斯化学株式会社 | 2022-09-20 | — | — | CN | disclosed |
| US-11094526-B2 | Liquid composition for imparting alcohol-repellency to semiconductor substrate material, and method for treating surface of semiconductor substrate using said liquid composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-08-17 | — | — | US | disclosed |
| EP-3404700-B1 | LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2020-05-13 | — | — | EP | disclosed |
| US-20190019672-A1 | LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2019-01-17 | — | — | US | disclosed |
| EP-3404700-A1 | LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-11-21 | — | — | EP | disclosed |
| EP-2303899-B1 | PROCESS FOR PREPARING BIS(FLUOROALKYL)PHOSPHINIC ACID OR FLUOROALKYLPHOSPHONIC ACID | MERCK PATENT GMBH (DE) | 2014-09-24 | — | — | EP | disclosed |
| US-20110130589-A1 | PROCESS FOR THE PREPARATION OF BIS(FLUOROALKYL)PHOSPHINIC ACID OR FLUOROALKYLPHOSPHONIC ACID | MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) | 2011-06-02 | — | — | US | disclosed |
| EP-2303899-A1 | PROCESS FOR PREPARING BIS(FLUOROALKYL)PHOSPHINIC ACID OR FLUOROALKYLPHOSPHONIC ACID | Merck Patent GmbH (DE) | 2011-04-06 | — | — | EP | disclosed |
| WO-2010012359-A1 | PROCESS FOR PREPARING BIS(FLUOROALKYL)PHOSPHINIC ACID OR FLUOROALKYLPHOSPHONIC ACID | MERCK PATENT GMBH (DE) | 2010-02-04 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110130589-A1 | PROCESS FOR THE PREPARATION OF BIS(FLUOROALKYL)PHOSPHINIC ACID OR FLUOROALKYLPHOSPHONIC ACID | PHOSPHO1, PPIP5K2, PTEN | PGK1 784/4885PGK2 1141/4885PTPN1 463/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.