SCHEMBL15423441

SCHEMBL15423441

CS(=O)(=O)On1c(=O)c2cc3sc4ccccc4sc3cc2c1=O

nearest known ligand 0.35

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
CASP3 P42574 4/20 0.35
ALDH1A1 P00352 4/20 0.35
KDM4E B2RXH2 2/20 0.35
MAPT P10636 2/20 0.35
RAB9A P51151 2/20 0.35
NPC1 O15118 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
G6PD P11413 2/20 0.34
CA2 P00918 1/20 0.33
PMM2 O15305 2/20 0.32
MPI P34949 2/20 0.32
PKM P14618 1/20 0.32
PHOSPHO1 Q8TCT1 1/20 0.32
APOBEC3G Q9HC16 1/20 0.32
GPR3 P46089 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3827616 0.79 ALDH1A1 (0.36) ALDH1A1CA2
SCHEMBL17130613 0.78 MAPK1 (0.41) ALDH1A1KDM4EMAPTTDP1L3MBTL1
SCHEMBL17130662 0.72 BRD4 (0.40) RAB9ANPC1G6PDPMM2MPI
SCHEMBL17130702 0.71 ATM (0.41) ALDH1A1KDM4EMAPTRAB9ANPC1
SCHEMBL16883335 0.71 PMM2 (0.34) MAPTG6PDPMM2MPIPHOSPHO1
SCHEMBL17130664 0.69 BRD4 (0.37) KDM4ERAB9ANPC1G6PDCA2
SCHEMBL4826493 0.65 PARL (0.53) ALDH1A1KDM4EMAPTTDP1L3MBTL1
SCHEMBL4826566 0.61 ALDH1A1 (0.34) ALDH1A1CA2
SCHEMBL13952058 0.61 ALDH1A1 (0.42) ALDH1A1KDM4EMAPTRAB9ANPC1
SCHEMBL4829794 0.61 KMT2A (0.47) ALDH1A1KDM4EMAPTCA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9946157-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2018-04-17 US disclosed
US-9740097-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-08-22 US disclosed
US-20160291466-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-10-06 US disclosed
US-20160291467-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-10-06 US disclosed
US-20160291465-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-10-06 US disclosed
US-20160291464-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-10-06 US disclosed
US-9201303-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2015-12-01 US disclosed
US-9182663-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2015-11-10 US disclosed
US-20150086927-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2015-03-26 US disclosed
US-20140017611-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-01-16 US disclosed