Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.41 |
| ▸ | NPC1 | O15118 | 3/20 | 0.41 |
| ▸ | RAB9A | P51151 | 3/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.41 |
| ▸ | MAPT | P10636 | 2/20 | 0.41 |
| ▸ | HPGD | P15428 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
| ▸ | GFER | P55789 | 1/20 | 0.41 |
| ▸ | HRH3 | Q9Y5N1 | 9/20 | 0.40 |
| ▸ | RECQL | P46063 | 1/20 | 0.40 |
| ▸ | POLB | P06746 | 1/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.39 |
| ▸ | CNR2 | P34972 | 2/20 | 0.39 |
| ▸ | MAOB | P27338 | 2/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14665303 | 0.85 | L3MBTL1 (0.43) | TDP1NPC1RAB9AL3MBTL1MAPT | |
| SCHEMBL14068947 | 0.79 | TDP1 (0.54) | TDP1NPC1RAB9AMAPTHRH3 | |
| SCHEMBL14665322 | 0.78 | TDP1 (0.43) | TDP1L3MBTL1HRH3RECQLCNR2 | |
| SCHEMBL14665260 | 0.77 | NPC1 (0.47) | TDP1NPC1RAB9AL3MBTL1MAPT | |
| SCHEMBL13841334 | 0.76 | L3MBTL1 (0.56) | L3MBTL1HPGDALDH1A1POLB | |
| SCHEMBL18746071 | 0.74 | KMT2A (0.49) | TDP1NPC1RAB9AL3MBTL1MAPT | |
| SCHEMBL26356355 | 0.73 | L3MBTL1 (0.40) | TDP1NPC1RAB9AL3MBTL1MAPT | |
| SCHEMBL14665375 | 0.72 | HPGD (0.42) | NPC1RAB9AL3MBTL1MAPTHPGD | |
| SCHEMBL1952350 | 0.72 | TDP1 (0.54) | TDP1NPC1RAB9AL3MBTL1MAPT | |
| SCHEMBL1105067 | 0.72 | POLB (0.44) | NPC1RAB9AL3MBTL1MAPTHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8889339-B2 | Resist pattern forming method, resist pattern, crosslinkable negative chemical amplification resist composition for organic solvent development, resist film and resist-coated mask blanks | FUJIFILM CORPORATION (JP) | 2014-11-18 | — | — | US | disclosed |
| US-20140030640-A1 | RESIST PATTERN FORMING METHOD, RESIST PATTERN, CROSSLINKABLE NEGATIVE CHEMICAL AMPLIFICATION RESIST COMPOSITION FOR ORGANIC SOLVENT DEVELOPMENT, RESIST FILM AND RESIST-COATED MASK BLANKS | FUJIFILM CORPORATION (JP) | 2014-01-30 | — | — | US | disclosed |