SCHEMBL15470540

SCHEMBL15470540

C=C(C)C(=O)OC(C)(C)C1CC=C(C)CC1

nearest known ligand 0.51

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
LMNA P02545 4/20 0.51
CYP3A4 P08684 2/20 0.49
ALOX15 P16050 2/20 0.49
PTPN1 P18031 1/20 0.43
STAT3 P40763 2/20 0.43
MAPK1 P28482 2/20 0.43
MEN1 O00255 1/20 0.43
KMT2A Q03164 1/20 0.43
CHRNA7 P36544 1/20 0.43
CES2 O00748 3/20 0.37
TSHR P16473 2/20 0.32
NPC1 O15118 1/20 0.32
ALDH1A1 P00352 1/20 0.32
RAB9A P51151 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
HTT P42858 1/20 0.32
TAS2R46 P59540 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15470578 0.92 LMNA (0.42) LMNACYP3A4ALOX15PTPN1STAT3
SCHEMBL15470580 0.87 LMNA (0.43) LMNACYP3A4ALOX15PTPN1STAT3
SCHEMBL15470548 0.87 LMNA (0.38) LMNACYP3A4ALOX15PTPN1STAT3
SCHEMBL25380939 0.86 LMNA (0.59) LMNACYP3A4ALOX15PTPN1STAT3
SCHEMBL15470545 0.86 LMNA (0.49) LMNACYP3A4ALOX15PTPN1STAT3
SCHEMBL15470536 0.86 LMNA (0.46) LMNACYP3A4ALOX15PTPN1STAT3
SCHEMBL18316481 0.85 LMNA (0.60) LMNACYP3A4ALOX15PTPN1STAT3
SCHEMBL12663607 0.85 LMNA (0.60) LMNACYP3A4ALOX15PTPN1STAT3
SCHEMBL580624 0.85 LMNA (0.60) LMNACYP3A4ALOX15PTPN1STAT3
SCHEMBL15470544 0.84 LMNA (0.47) LMNACYP3A4ALOX15PTPN1STAT3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9075308-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-07 US disclosed
US-9075308-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-07 US disclosed
US-20140045122-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-02-13 US disclosed
US-20140045122-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-02-13 US disclosed