Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 3/20 | 0.48 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.48 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.48 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.43 |
| ▸ | STAT3 | P40763 | 2/20 | 0.42 |
| ▸ | MEN1 | O00255 | 1/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.42 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.42 |
| ▸ | CES2 | O00748 | 1/20 | 0.34 |
| ▸ | NPC1 | O15118 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | RAB9A | P51151 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15470540 | 0.84 | LMNA (0.51) | LMNACYP3A4ALOX15PTPN1STAT3 | |
| SCHEMBL15470545 | 0.82 | LMNA (0.49) | LMNACYP3A4ALOX15PTPN1STAT3 | |
| SCHEMBL15470551 | 0.80 | LMNA (0.54) | LMNACYP3A4ALOX15PTPN1STAT3 | |
| SCHEMBL15470543 | 0.80 | LMNA (0.47) | LMNACYP3A4ALOX15PTPN1STAT3 | |
| SCHEMBL15470544 | 0.80 | LMNA (0.47) | LMNACYP3A4ALOX15PTPN1STAT3 | |
| SCHEMBL15470546 | 0.79 | LMNA (0.46) | LMNACYP3A4ALOX15PTPN1STAT3 | |
| SCHEMBL15470557 | 0.79 | LMNA (0.46) | LMNACYP3A4ALOX15PTPN1STAT3 | |
| SCHEMBL15470550 | 0.78 | LMNA (0.46) | LMNACYP3A4ALOX15PTPN1STAT3 | |
| SCHEMBL15470578 | 0.76 | LMNA (0.42) | LMNACYP3A4ALOX15PTPN1STAT3 | |
| SCHEMBL25380943 | 0.75 | LMNA (0.57) | LMNACYP3A4ALOX15PTPN1STAT3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9075308-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-07 | — | — | US | disclosed |
| US-9075308-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-07 | — | — | US | disclosed |
| US-20140045122-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-02-13 | — | — | US | disclosed |
| US-20140045122-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-02-13 | — | — | US | disclosed |