SCHEMBL15470550

SCHEMBL15470550

C=C(C)C(=O)OC(CC)(CC)C1CC=C(C)CC1

nearest known ligand 0.46

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.46
ALOX15 P16050 3/20 0.46
CYP3A4 P08684 2/20 0.46
PTPN1 P18031 1/20 0.41
STAT3 P40763 2/20 0.40
MAPK1 P28482 2/20 0.40
MEN1 O00255 1/20 0.40
KMT2A Q03164 1/20 0.40
CHRNA7 P36544 1/20 0.40
TSHR P16473 2/20 0.33
ALDH1A1 P00352 2/20 0.33
NPC1 O15118 1/20 0.33
RAB9A P51151 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
CES2 O00748 3/20 0.32
TAS2R46 P59540 2/20 0.30
POLB P06746 1/20 0.30
HTT P42858 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15470551 0.86 LMNA (0.54) LMNAALOX15CYP3A4PTPN1STAT3
SCHEMBL15470540 0.82 LMNA (0.51) LMNAALOX15CYP3A4PTPN1STAT3
SCHEMBL15470545 0.80 LMNA (0.49) LMNAALOX15CYP3A4PTPN1STAT3
SCHEMBL16807398 0.78 ALDH1A1 (0.37) TSHRALDH1A1
SCHEMBL15470544 0.78 LMNA (0.47) LMNAALOX15CYP3A4PTPN1STAT3
SCHEMBL15470543 0.78 LMNA (0.47) LMNAALOX15CYP3A4PTPN1STAT3
SCHEMBL15470552 0.78 LMNA (0.48) LMNAALOX15CYP3A4PTPN1STAT3
SCHEMBL15470546 0.77 LMNA (0.46) LMNAALOX15CYP3A4PTPN1STAT3
SCHEMBL15470557 0.77 LMNA (0.46) LMNAALOX15CYP3A4PTPN1STAT3
SCHEMBL22201018 0.75 ALDH1A1 (0.35) TSHRALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9075308-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-07 US disclosed
US-9075308-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-07 US disclosed
US-20140045122-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-02-13 US disclosed
US-20140045122-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-02-13 US disclosed