SCHEMBL15470664

SCHEMBL15470664

COCCOCCCOCn1cnc2ccccc21

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 11/20 0.60
LMNA P02545 7/20 0.60
TSHR P16473 2/20 0.51
ALOX15 P16050 1/20 0.51
HTT P42858 5/20 0.50
MAPT P10636 3/20 0.50
STAT3 P40763 1/20 0.50
MEN1 O00255 2/20 0.49
KMT2A Q03164 2/20 0.49
TDP1 Q9NUW8 1/20 0.49
L3MBTL1 Q9Y468 1/20 0.47
RAB9A P51151 2/20 0.45
NPC1 O15118 1/20 0.45
NFKB1 P19838 1/20 0.45
NFKB2 Q00653 1/20 0.45
RELA Q04206 1/20 0.45
CYP11B1 P15538 4/20 0.44
CYP11B2 P19099 4/20 0.44
TNF P01375 1/20 0.44
NPSR1 Q6W5P4 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28299452 0.94 SMN1; SMN2 (0.62) SMN1; SMN2LMNATSHRALOX15HTT
SCHEMBL22307532 0.86 SMN1; SMN2 (0.68) SMN1; SMN2LMNATSHRALOX15HTT
SCHEMBL5374402 0.84 SMN1; SMN2 (0.85) SMN1; SMN2LMNATSHRALOX15HTT
SCHEMBL501944 0.84 SMN1; SMN2 (0.85) SMN1; SMN2LMNATSHRALOX15HTT
SCHEMBL92599 0.84 SMN1; SMN2 (0.85) SMN1; SMN2LMNATSHRALOX15HTT
SCHEMBL14423493 0.84 SMN1; SMN2 (0.85) SMN1; SMN2LMNATSHRALOX15HTT
SCHEMBL2640498 0.80 TDP1 (0.63) SMN1; SMN2LMNATSHRALOX15HTT
SCHEMBL3067924 0.80 TDP1 (0.68) SMN1; SMN2LMNATSHRALOX15HTT
SCHEMBL502183 0.79 SMN1; SMN2 (0.75) SMN1; SMN2LMNATSHRALOX15HTT
SCHEMBL2357255 0.78 SMN1; SMN2 (0.56) SMN1; SMN2LMNATSHRALOX15HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9075308-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-07 US disclosed
US-9075308-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-07 US disclosed
US-20140045122-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-02-13 US disclosed
US-20140045122-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-02-13 US disclosed