SCHEMBL15470852

SCHEMBL15470852

CCC(C)(C)C(=O)OC12CC3CC(CC(C3)C1CC(=O)OC(C)(C)C)C2

nearest known ligand 0.36

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 2/20 0.36
MEN1 O00255 1/20 0.33
MAPK1 P28482 1/20 0.33
KMT2A Q03164 1/20 0.33
CACNA1H O95180 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13868796 0.86 HSD11B1 (0.35)
SCHEMBL683013 0.84 ALDH1A1 (0.31)
SCHEMBL15470851 0.84 SCN1A (0.33)
SCHEMBL17750341 0.80 EPHX2 (0.33) EPHX2
SCHEMBL2733974 0.78 CYP17A1 (0.33) EPHX2MEN1KMT2A
SCHEMBL10204838 0.78 CYP17A1 (0.33) MEN1KMT2A
SCHEMBL17750342 0.77 ALDH1A1 (0.31)
SCHEMBL15889448 0.76 EPHX2 (0.30) EPHX2
SCHEMBL13219532 0.76 ALDH1A1 (0.30)
SCHEMBL2741160 0.74 KMT2A (0.31) MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9482947-B2 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device and electronic device FUJIFILM CORPORATION (JP) 2016-11-01 US disclosed
US-20140045117-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2014-02-13 US disclosed