Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTGS1 | P23219 | 4/20 | 0.45 |
| ▸ | PTGS2 | P35354 | 4/20 | 0.45 |
| ▸ | GSTK1 | Q9Y2Q3 | 2/20 | 0.38 |
| ▸ | ENPEP | Q07075 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | PKM | P14618 | 1/20 | 0.35 |
| ▸ | PTGER4 | P35408 | 7/20 | 0.34 |
| ▸ | PTGER3 | P43115 | 6/20 | 0.34 |
| ▸ | PTGER2 | P43116 | 5/20 | 0.34 |
| ▸ | F13A1 | P00488 | 2/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1081993 | 0.89 | PTGS1 (0.38) | PTGS1PTGS2ENPEPALDH1A1PKM | |
| SCHEMBL3625111 | 0.80 | MGLL (0.41) | PTGS1PTGS2ALDH1A1PTGER4PTGER2 | |
| SCHEMBL1357303 | 0.79 | KMT2A (0.43) | PTGS1PTGS2ALDH1A1PKM | |
| SCHEMBL30773222 | 0.74 | ALDH1A1 (0.49) | GSTK1ENPEPALDH1A1PKMPTGER4 | |
| SCHEMBL28536934 | 0.74 | PTGS1 (0.50) | PTGS1PTGS2GSTK1ENPEPALDH1A1 | |
| SCHEMBL28539909 | 0.74 | PTGS1 (0.50) | PTGS1PTGS2GSTK1ENPEPALDH1A1 | |
| SCHEMBL28883075 | 0.74 | ALDH1A1 (0.30) | ALDH1A1PKM | |
| SCHEMBL9281851 | 0.74 | SMN1; SMN2 (0.41) | PTGS1PTGS2ALDH1A1 | |
| SCHEMBL846234 | 0.73 | ALDH1A1 (0.47) | GSTK1ALDH1A1PKMPTGER4PTGER3 | |
| SCHEMBL4310967 | 0.73 | GSTK1 (0.37) | PTGS1PTGS2GSTK1ENPEPPTGER4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105842985-B | Colored photosensitive resin composition | 住友化学株式会社 | 2021-01-26 | — | — | CN | disclosed |
| CN-105573055-B | Colored curable resin composition | 住友化学株式会社 | 2020-11-17 | — | — | CN | disclosed |
| US-10162260-B2 | Photosensitive resin composition, protective film, and liquid crystal display element | CHI MEI CORPORATION (TW) | 2018-12-25 | — | — | US | disclosed |
| EP-3408271-A1 | MAYTANSINOID DERIVATIVES, CONJUGATES THEREOF, AND METHODS OF USE | Regeneron Pharmaceuticals, Inc. (US) | 2018-12-05 | — | — | EP | disclosed |
| US-9851638-B2 | Photosensitive polysiloxane composition and uses thereof | CHI MEI CORPORATION (TW) | 2017-12-26 | — | — | US | disclosed |
| WO-2017132173-A1 | MAYTANSINOID DERIVATIVES, CONJUGATES THEREOF, AND METHODS OF USE | REGENERON PHARMACEUTICALS, INC. (US) | 2017-08-03 | — | — | WO | disclosed |
| US-20170168390-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PROTECTIVE FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT | CHI MEI CORPORATION (TW) | 2017-06-15 | — | — | US | disclosed |
| US-9606436-B2 | Photosensitive resin composition and application thereof | CHI MEI CORPORATION (TW) | 2017-03-28 | — | — | US | disclosed |
| US-20170052446-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND APPLICATION THEREOF | CHI MEI CORPORATION (TW) | 2017-02-23 | — | — | US | disclosed |
| US-20170023860-A1 | PHOTOSENSITIVE POLYSILOXANE COMPOSITION AND USES THEREOF | CHI MEI CORP (TW) | 2017-01-26 | — | — | US | disclosed |
| US-9541832-B2 | Photosensitive resin composition, protective film and element having the same | CHI MEI CORPORATION (TW) | 2017-01-10 | — | — | US | disclosed |
| US-9422446-B2 | Photosensitive resin composition, protective film and element having the same | CHI MEI CORPORATION (TW) | 2016-08-23 | — | — | US | disclosed |
| US-20150378256-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PROTECTIVE FILM AND ELEMENT HAVING THE SAME | CHI MEI CORPORATION (TW) | 2015-12-31 | — | — | US | disclosed |
| US-20150376355-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PROTECTIVE FILM AND ELEMENT HAVING THE SAME | CHI MEI CORPORATION (TW) | 2015-12-31 | — | — | US | disclosed |
| US-8980506-B2 | Photosensitive resin composition and application thereof | CHI MEI CORPORATION (TW) | 2015-03-17 | — | — | US | disclosed |
| US-20150031808-A1 | PHOTOSENSITIVE POLYSILOXANE COMPOSITION AND USES THEREOF | CHI MEI CORPORATION (TW) | 2015-01-29 | — | — | US | disclosed |
| US-20140051017-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND APPLICATION THEREOF | CHI MEI CORPORATION (TW) | 2014-02-20 | — | — | US | disclosed |