SCHEMBL155778

SCHEMBL155778

C[S+](Cc1ccccc1)c1ccc(O)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MMP3 P08254 1/20 0.43
BCL2L1 Q07817 1/20 0.43
LMNA P02545 2/20 0.42
FNTA P49354 1/20 0.42
FNTB P49356 1/20 0.42
CYP1A2 P05177 1/20 0.42
PTGS1 P23219 1/20 0.42
SLC6A2 P23975 1/20 0.42
CYP2C19 P33261 1/20 0.42
PTGS2 P35354 1/20 0.42
SLC6A3 Q01959 1/20 0.42
HIF1A Q16665 1/20 0.42
HDAC6 Q9UBN7 1/20 0.42
CA12 O43570 1/20 0.39
CA1 P00915 1/20 0.39
CA2 P00918 1/20 0.39
GLA P06280 1/20 0.39
CA3 P07451 1/20 0.39
CA4 P22748 1/20 0.39
CA9 Q16790 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL3038821 0.98 MMP3 (0.41) MMP3BCL2L1LMNAFNTAFNTB
SCHEMBL30365464 0.93 FNTA (0.42) MMP3BCL2L1LMNAFNTAFNTB
SCHEMBL4852324 0.93 MMP3 (0.42) MMP3BCL2L1LMNAFNTAFNTB
SCHEMBL30782244 0.93 LMNA (0.38) MMP3BCL2L1LMNAFNTAFNTB
SCHEMBL30931353 0.93 LMNA (0.38) MMP3BCL2L1LMNAFNTAFNTB
SCHEMBL29696673 0.93 LMNA (0.38) MMP3BCL2L1LMNAFNTAFNTB
SCHEMBL6271877 0.87 FNTA (0.41) MMP3BCL2L1LMNAFNTAFNTB
SCHEMBL1127762 0.85 TP53 (0.42) SLC6A2SLC6A3TDP1ALDH1A1CYP3A4
SCHEMBL1195467 0.84 MMP3 (0.35) MMP3BCL2L1LMNAFNTAFNTB
Phenylmethanesulfonic Acid SCHEMBL31168242 0.84 FNTA (0.39) FNTAFNTBCA1CA2CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 132 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4081597-A1 UV RESISTANT SURFACING MATERIALS FOR COMPOSITE PARTS Cytec Industries, Inc. (US) 2022-11-02 EP claimed
US-8575234-B2 Ink composition, and method of forming pattern, color filter and method of preparing color filter using the same SAMSUNG DISPLAY CO., LTD. (KR) 2013-11-05 US claimed
EP-1752463-B1 NOVEL FLUORINATED ALKYLFLUOROPHOSPHORIC ACID SALT OF ONIUM AND TRANSITION METAL COMPLEX SAN APRO LTD (JP) 2013-07-17 EP claimed
US-20120058273-A1 INK COMPOSITION, AND METHOD OF FORMING PATTERN, COLOR FILTER AND METHOD OF PREPARING COLOR FILTER USING THE SAME DONGWOO FINE-CHEM CO., LTD. (KR) 2012-03-08 US claimed
US-7709598-B2 Fluorinated alkyl fluorophoshoric acid salts of onium and transition metal complex SAN-APRO LIMITED (JP) 2010-05-04 US claimed
US-20070225458-A1 Novel Fluorinated Alkyl Fluorophosphoric Acid Salts of Onium and Ttransition Metal Complex SAN-APRO LIMITED (JP) 2007-09-27 US claimed
EP-1752463-A1 NOVEL FLUORINATED ALKYLFLUOROPHOSPHORIC ACID SALT OF ONIUM AND TRANSITION METAL COMPLEX San-Apro Limited (JP) 2007-02-14 EP claimed
US-20040242818-A1 Deodorizing agent for sulfur-or nitrogen-containing initiators UCB, S.A. (BE) 2004-12-02 US claimed
EP-1438347-A1 DEODORIZING AGENT FOR SULFUR- OR NITROGEN-CONTAINING INITIATORS UCB, S.A. (BE) 2004-07-21 EP claimed
EP-0882749-B1 Urethane prepolymer, process for producing the same and pressure-sensitive adhesive comprising the same KYOEISHA CHEMICAL CO LTD (JP) 2004-03-24 EP claimed
US-20030152862-A1 Deodorizing agent for sulfur- or nitrogen-containing initiators UCB, S. A. (BE) 2003-08-14 US claimed
US-20030108810-A1 Deodorizing agent for sulfur- or nitrogen-containing salt photoinitiators UCB, S.A. (BE) 2003-06-12 US claimed
WO-2003018663-A1 DEODORIZING AGENT FOR SULFUR- OR NITROGEN-CONTAINING INITIATORS UCB, S.A. (BE) 2003-03-06 WO claimed
US-6498200-B1 OXIRANE OR OXETANE RING COMPOUND, ORGANIC PEROXIDE, ONIUM SALT CATALYST, AND ALKALINE FILLER; CURES RAPIDLY; STABLE DOES NOT CAUSE INCREASE IN ELECTROCONDUCTIVITY OR CORROSION; SEALANT, BINDER, ENCAPSULATING AGENT, DIELECTRIC FILM NAMICS CORPORATION (JP) 2002-12-24 US claimed
US-6022907-A POLYESTERURETHANE FROM DIMER ACIDS, REACTIVE END GROUPSA KYOEISHA CHEMICAL CO., LTD. (JP) 2000-02-08 US claimed
EP-0882749-A2 Urethane prepolymer, process for producing the same and pressure-sensitive adhesive comprising the same KYOEISHA CHEMICAL CO., LTD. (JP) 1998-12-09 EP claimed
EP-4634262-A1 ONE-COMPONENT CATIONIC POLYMERIZABLE COMPOSITION Huntsman Advanced Materials (Switzerland) GmbH (CH) 2025-10-22 EP disclosed
CN-119855857-A Conductive composition 拓自达电线株式会社 2025-04-18 CN disclosed
WO-1998032566-A1 COATED ABRASIVE PRODUCTS UCB, S.A. (BE) 1998-07-30 WO disclosed
US-5730764-A BLEND OF CURABLE EPOXY RESIN AND ONIUM SALT SURFACE SPECIALTIES, S.A. (BE) 1998-03-24 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070225458-A1 Novel Fluorinated Alkyl Fluorophosphoric Acid Salts of Onium and Ttransition Metal Complex AS3MT, TTR, PFAS MMP3 4559/4885BCL2L1 4394/4885LMNA 829/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.