Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.39 |
| ▸ | CA2 | P00918 | 11/20 | 0.35 |
| ▸ | CA1 | P00915 | 10/20 | 0.35 |
| ▸ | HDAC1 | Q13547 | 3/20 | 0.35 |
| ▸ | HDAC7 | Q8WUI4 | 3/20 | 0.35 |
| ▸ | HDAC8 | Q9BY41 | 3/20 | 0.35 |
| ▸ | HDAC6 | Q9UBN7 | 3/20 | 0.35 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.35 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.35 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.35 |
| ▸ | HDAC10 | Q969S8 | 1/20 | 0.35 |
| ▸ | HDAC11 | Q96DB2 | 1/20 | 0.35 |
| ▸ | HDAC9 | Q9UKV0 | 1/20 | 0.35 |
| ▸ | HDAC5 | Q9UQL6 | 1/20 | 0.35 |
| ▸ | CES1 | P23141 | 2/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | CA4 | P22748 | 1/20 | 0.31 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29746113 | 1.00 | THRB (0.39) | THRBCA2CA1HDAC1HDAC7 | |
| SCHEMBL4962404 | 0.98 | THRB (0.42) | THRBCA2CA1HDAC1HDAC7 | |
| SCHEMBL4962222 | 0.98 | THRB (0.42) | THRBCA2CA1HDAC1HDAC7 | |
| SCHEMBL4962900 | 0.98 | THRB (0.42) | THRBCA2CA1HDAC1HDAC7 | |
| SCHEMBL4962460 | 0.98 | THRB (0.42) | THRBCA2CA1HDAC1HDAC7 | |
| SCHEMBL545780 | 0.95 | CES1 (0.34) | THRBCA2CA1HDAC1HDAC7 | |
| SCHEMBL29745841 | 0.95 | CES1 (0.34) | THRBCA2CA1HDAC1HDAC7 | |
| SCHEMBL4962904 | 0.93 | HDAC1 (0.40) | THRBCA2CA1HDAC1HDAC7 | |
| SCHEMBL4961195 | 0.90 | GAA (0.41) | THRBCA2CA1HDAC1HDAC7 | |
| SCHEMBL4964156 | 0.90 | GAA (0.41) | THRBCA2CA1HDAC1HDAC7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2384457-B1 | COATING COMPOSITIONS | MERCK PATENT GMBH (DE) | 2022-07-06 | — | — | EP | disclosed |
| EP-2278399-B1 | Positive-working resist composition | FUJIFILM CORP (JP) | 2013-05-15 | — | — | EP | disclosed |
| EP-1626309-B1 | Hologram recording material, hologram recording method and holographic optical element | FUJIFILM CORP (JP) | 2011-07-27 | — | — | EP | disclosed |
| EP-1492092-B1 | Two-photon absorbing optical recording material and two-photon absorbing optical recording and reproducing method | FUJIFILM CORP (JP) | 2011-04-13 | — | — | EP | disclosed |
| US-20100239962-A1 | TWO-PHOTON ABSORBING OPTICAL RECORDING MATERIAL AND TWO-PHOTON ABSORBING OPTICAL RECORDING AND REPRODUCING METHOD | FUJIFILM CORPORATION (JP) | 2010-09-23 | — | — | US | disclosed |
| US-7771915-B2 | Two-photon absorbing optical recording material and two-photon absorbing optical recording and reproducing method | FUJIFILM CORPORATION (JP) | 2010-08-10 | — | — | US | disclosed |
| EP-2180467-A1 | Photon-mode recording method | Fujifilm Corporation (JP) | 2010-04-28 | — | — | EP | disclosed |
| US-7588863-B2 | Hologram recording method and hologram recording material | FUJIFILM CORPORATION (JP) | 2009-09-15 | — | — | US | disclosed |
| US-7582390-B2 | Two-photon absorbing polymerization method, two-photon absorbing optical recording material and two-photon absorbing optical recording method | FUJIFILM CORPORATION (JP) | 2009-09-01 | — | — | US | disclosed |
| US-7582391-B2 | Two-photon absorption decolorizable material, two-photon absorption refractive index modulation material, two-photon absorption polymerization material, two-photon absorption polymerization method and three-dimensional optical recording material | FUJIFILM CORPORATION (JP) | 2009-09-01 | — | — | US | disclosed |
| EP-1480079-A2 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 2004-11-24 | — | — | EP | disclosed |
| US-6811947-B2 | RESIN, WHICH IS DECOMPOSED BY THE ACTION OF AN ACID TO INCREASE SOLUBILITY IN AN ALKALI DEVELOPING SOLUTION | FUJI PHOTO FILM CO., LTD. (JP) | 2004-11-02 | — | — | US | disclosed |
| US-20040009430-A1 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. | 2004-01-15 | — | — | US | disclosed |
| US-20040005512-A1 | Positive-working resist composition | FUJI PHOTO FILM CO., LTD. | 2004-01-08 | — | — | US | disclosed |
| EP-1376232-A1 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 2004-01-02 | — | — | EP | disclosed |
| EP-1367440-A2 | Positive-working resist composition | Fuji Photo Film Co., Ltd. (JP) | 2003-12-03 | — | — | EP | disclosed |
| US-20030203308-A1 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. | 2003-10-30 | — | — | US | disclosed |
| US-20030194641-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2003-10-16 | — | — | US | disclosed |
| US-6485883-B2 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2002-11-26 | — | — | US | disclosed |
| US-20010041300-A1 | Positive photoresist composition | FUJIFILM CORPORATION (JP) | 2001-11-15 | — | — | US | disclosed |