SCHEMBL15840344

SCHEMBL15840344

C=C(C)C(=O)OC(C(F)(F)F)(C(F)(F)F)C(F)(F)C(F)(F)F

nearest known ligand 0.39

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.39
TSHR P16473 1/20 0.32
THRB P10828 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31532272 0.94 ALDH1A1 (0.38) ALDH1A1TSHRTHRB
SCHEMBL15840346 0.92 ALDH1A1 (0.37) ALDH1A1TSHRTHRB
SCHEMBL31364544 0.89 ALDH1A1 (0.44) ALDH1A1TSHRTHRB
SCHEMBL771313 0.89 ALDH1A1 (0.44) ALDH1A1TSHRTHRB
SCHEMBL14336616 0.85 ALDH1A1 (0.34) ALDH1A1
SCHEMBL772723 0.81 ALDH1A1 (0.41) ALDH1A1TSHRTHRB
SCHEMBL5889516 0.79 ALDH1A1 (0.39) ALDH1A1TSHRTHRB
SCHEMBL5086524 0.79 ALDH1A1 (0.39) ALDH1A1TSHRTHRB
SCHEMBL630211 0.79 ALDH1A1 (0.39) ALDH1A1TSHRTHRB
SCHEMBL8668628 0.78 ALDH1A1 (0.38) ALDH1A1TSHRTHRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9760010-B2 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-09-12 US disclosed
US-20160363866-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-12-15 US disclosed
US-9201300-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-12-01 US disclosed
US-20140178818-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-06-26 US disclosed