SCHEMBL15858320

SCHEMBL15858320

CC(=O)NCC(C)(F)S(=O)(=O)O

nearest known ligand 0.38

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 2/20 0.38
KDM4E B2RXH2 1/20 0.38
HIF1A Q16665 1/20 0.38
ALDH1A1 P00352 3/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
PAOX Q6QHF9 3/20 0.32
ADRA1A P35348 1/20 0.31
SMN1; SMN2 Q16637 2/20 0.31
POLB P06746 1/20 0.31
TSHR P16473 1/20 0.31
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30
NPSR1 Q6W5P4 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14970370 0.75
SCHEMBL295464 0.72
SCHEMBL21135945 0.71 ALDH1A1 (0.37) ALDH1A1L3MBTL1SMN1; SMN2
SCHEMBL16790656 0.71 KDM4E (0.37) MAPK1KDM4EHIF1AALDH1A1PAOX
SCHEMBL10202748 0.71 KDM4E (0.37) MAPK1KDM4EHIF1AALDH1A1PAOX
SCHEMBL7026914 0.71 KDM4E (0.38) MAPK1KDM4EHIF1AALDH1A1PAOX
Hydrochloric Acid SCHEMBL6594526 0.70 KDM4E (0.40) MAPK1KDM4EHIF1AALDH1A1L3MBTL1
Ammonia Solution, Strong SCHEMBL28281906 0.70 KDM4E (0.40) MAPK1KDM4EHIF1AALDH1A1L3MBTL1
SCHEMBL4760790 0.69 KDM4E (0.37) MAPK1KDM4EHIF1APAOXADRA1A
SCHEMBL73996 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150338736-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN FUJIFILM CORPORATION (JP) 2015-11-26 US disclosed
WO-2014104400-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN FUJIFILM CORPORATION (JP) 2014-07-03 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20150338736-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN AFF1, MACF1, RER1 MAPK1 2149/4885KDM4E 2453/4885HIF1A 2692/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.