SCHEMBL15869166

SCHEMBL15869166

C=CCOc1ccc(C2CCC(c3ccc(OCC=C)cc3)(c3ccc(OCC=C)cc3)CC2)cc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.42
TSHR P16473 2/20 0.42
MAPT P10636 4/20 0.39
NPC1 O15118 1/20 0.39
RAB9A P51151 1/20 0.39
CA12 O43570 3/20 0.39
CA1 P00915 3/20 0.39
CA9 Q16790 3/20 0.39
CA2 P00918 1/20 0.39
CA7 P43166 1/20 0.39
TDP1 Q9NUW8 1/20 0.38
MEN1 O00255 2/20 0.37
KMT2A Q03164 2/20 0.37
KDM4E B2RXH2 1/20 0.37
GAA P10253 1/20 0.37
HPGD P15428 1/20 0.37
MMP1 P03956 1/20 0.37
MMP2 P08253 1/20 0.37
MMP9 P14780 1/20 0.37
ADRA2A P08913 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31267768 0.84 CA12 (0.47) ALDH1A1TSHRMAPTNPC1RAB9A
SCHEMBL826438 0.81 PSMB1 (0.50) ALDH1A1TSHRMAPTNPC1RAB9A
SCHEMBL15869193 0.80 MAPT (0.39) ALDH1A1TSHRMAPTNPC1RAB9A
SCHEMBL2586831 0.80 NPC1 (0.54) ALDH1A1TSHRMAPTNPC1RAB9A
SCHEMBL472145 0.80 PSMB1 (0.53) ALDH1A1TSHRMAPTNPC1RAB9A
SCHEMBL603312 0.77 HRH3 (0.51) ALDH1A1TSHRMAPTNPC1RAB9A
SCHEMBL603311 0.77 HRH3 (0.51) ALDH1A1TSHRMAPTNPC1RAB9A
SCHEMBL12835619 0.77 ESR2 (0.47) ALDH1A1TSHRMAPTNPC1RAB9A
SCHEMBL9231620 0.74 ALDH1A1 (0.36) ALDH1A1TSHRTDP1MMP2
SCHEMBL10619463 0.72 CYP2C9 (0.49) ALDH1A1TSHRMAPTNPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9377690-B2 Compositon for forming metal oxide-containing film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-28 US disclosed
US-9377690-B2 Compositon for forming metal oxide-containing film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-28 US disclosed
US-20140193757-A1 COMPOSITON FOR FORMING METAL OXIDE-CONTAINING FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-07-10 US disclosed
US-20140193757-A1 COMPOSITON FOR FORMING METAL OXIDE-CONTAINING FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-07-10 US disclosed