Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 7/20 | 0.68 |
| ▸ | CES2 | O00748 | 1/20 | 0.68 |
| ▸ | CES1 | P23141 | 1/20 | 0.68 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.54 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.54 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.46 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.46 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.45 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.43 |
| ▸ | HPGD | P15428 | 2/20 | 0.43 |
| ▸ | TSHR | P16473 | 1/20 | 0.43 |
| ▸ | NAAA | Q02083 | 2/20 | 0.43 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.43 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.43 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.43 |
| ▸ | PGR | P06401 | 1/20 | 0.42 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.42 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzoin SCHEMBL7056366 | 0.94 | LMNA (0.64) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL10336419 | 0.93 | LMNA (0.58) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL50247 | 0.91 | LMNA (0.64) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL1151761 | 0.90 | LMNA (0.58) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL2754342 | 0.89 | LMNA (0.62) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL11319258 | 0.88 | LMNA (0.60) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL715223 | 0.88 | LMNA (0.60) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL10884070 | 0.88 | LMNA (0.60) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL28774157 | 0.88 | LMNA (0.60) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL10883525 | 0.88 | LMNA (0.60) | LMNACES2CES1ALDH1A1KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 5469 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115247041-A | UV thermal dual-curing screen adhesive | 无锡博加电子新材料有限公司 | 2022-10-28 | — | — | CN | claimed |
| CN-114690559-A | Photosensitive resin composition, cured film and display device | 株式会社东进世美肯 | 2022-07-01 | — | — | CN | claimed |
| CN-112063226-B | Photocuring PCB circuit board protective ink | 无锡博加电子新材料有限公司 | 2022-03-01 | — | — | CN | claimed |
| CN-114114837-A | Dry film resist and preparation method thereof | 杭州福斯特电子材料有限公司 | 2022-03-01 | — | — | CN | claimed |
| CN-109674770-B | Controlled release membrane capable of controlling release of polypeptide drug and preparation method and application thereof | 上海交通大学 | 2021-08-27 | — | — | CN | claimed |
| CN-110283320-B | Synthesis method of antibacterial hydrogel capable of being hydrolyzed under weak alkaline | 浙江工业大学 | 2021-08-24 | — | — | CN | claimed |
| CN-108287452-B | Photosensitive resin composition with rapid development and excellent irregular hole covering performance | 浙江福斯特新材料研究院有限公司 | 2021-04-06 | — | — | CN | claimed |
| CN-109722160-B | High-wear-resistance UV (ultraviolet) photocuring release layer applied to gold stamping material and preparation thereof | 上海乘鹰新材料有限公司 | 2020-12-29 | — | — | CN | claimed |
| CN-112063226-A | Photocuring PCB circuit board protective ink | 无锡博加电子新材料有限公司 | 2020-12-11 | — | — | CN | claimed |
| CN-108250940-B | High-wear-resistance UV release agent coating applied to slipper transfer printing and preparation method thereof | 上海乘鹰新材料有限公司 | 2020-08-07 | — | — | CN | claimed |
| US-4996134-A | Conjugated diene copolymer, a process for producing the copolymer, and a photosensitive composition comprising the copolymer | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1991-02-26 | — | — | US | claimed |
| US-4996132-A | Heat-resistant photosensitive resin composition | TOYKO OHKA KOGYO CO. LTD. (JP) | 1991-02-26 | — | — | US | claimed |
| CN-1010713-B | CONJUGATED DIENE COPOLYMER, A PROCESS FOR PRODUCING THE COPOLYMER, AND A PHOTOSENSITIVE COMPSITION COMPRISING THE COPOLYMER | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1990-12-05 | — | — | CN | claimed |
| US-4937173-A | Radiation curable liquid resin composition containing microparticles | NIPPON PAINT CO., LTD. (JP) | 1990-06-26 | — | — | US | claimed |
| US-4911864-A | Mixture of (meth)acryloyl group and electroconductive particles | NIPPON OIL CO., LTD. (JP) | 1990-03-27 | — | — | US | claimed |
| EP-0281365-A2 | Curable compositions | NIPPON OIL CO. LTD. (JP) | 1988-09-07 | — | — | EP | claimed |
| EP-0280295-A2 | A heat-resistant photosensitive resin composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1988-08-31 | — | — | EP | claimed |
| US-4703338-A | Resin composition to seal electronic device | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 1987-10-27 | — | — | US | claimed |
| EP-0162570-A1 | A conjugated diene copolymer, a process for producing the copolymer, and a photosensitive composition comprising the copolymer | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1985-11-27 | — | — | EP | claimed |
| US-3968305-A | Mar-resistant synthetic resin shaped article | MITSUBISHI RAYON CO., LTD. (JA) | 1976-07-06 | — | — | US | claimed |