Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 4/20 | 0.62 |
| ▸ | CES2 | O00748 | 2/20 | 0.62 |
| ▸ | CES1 | P23141 | 2/20 | 0.62 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.50 |
| ▸ | NAAA | Q02083 | 2/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.50 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.49 |
| ▸ | NPC1 | O15118 | 2/20 | 0.49 |
| ▸ | RAB9A | P51151 | 2/20 | 0.49 |
| ▸ | GAA | P10253 | 1/20 | 0.47 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.43 |
| ▸ | TSHR | P16473 | 2/20 | 0.43 |
| ▸ | TP53 | P04637 | 1/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzoin SCHEMBL11319258 | 0.99 | LMNA (0.60) | LMNACES2CES1ALDH1A1NAAA | |
| Benzoin SCHEMBL10884070 | 0.99 | LMNA (0.60) | LMNACES2CES1ALDH1A1NAAA | |
| Benzoin SCHEMBL715223 | 0.99 | LMNA (0.60) | LMNACES2CES1ALDH1A1NAAA | |
| Benzoin SCHEMBL10883525 | 0.99 | LMNA (0.60) | LMNACES2CES1ALDH1A1NAAA | |
| Benzoin SCHEMBL50247 | 0.95 | LMNA (0.64) | LMNACES2CES1ALDH1A1NAAA | |
| Benzoin SCHEMBL28774157 | 0.93 | LMNA (0.60) | LMNACES2CES1ALDH1A1NAAA | |
| Benzoin SCHEMBL28674567 | 0.92 | LMNA (0.58) | LMNACES2CES1ALDH1A1NAAA | |
| Benzoin SCHEMBL158692 | 0.89 | LMNA (0.68) | LMNACES2CES1ALDH1A1NAAA | |
| Benzoin SCHEMBL28225027 | 0.89 | LMNA (0.55) | LMNACES2CES1ALDH1A1NAAA | |
| Benzoin SCHEMBL27599406 | 0.89 | LMNA (0.55) | LMNACES2CES1ALDH1A1NAAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20220056281-A1 | APPLICATION OF ANTIMICROBIAL COATINGS USING ATMOSPHERIC PRESSURE PLASMA SPRAY SYSTEMS | TRITON SYSTEMS, INC. | 2022-02-24 | — | — | US | claimed |
| EP-0020473-A1 | PHOSPHINE ACTIVATED PHOTOSENSITIVE COMPOSITIONS AND PHOTOPOLYMER PRINTING PLATES MADE THEREFROM. | NAPP SYSTEMS INC (US) | 1981-01-07 | — | — | EP | claimed |
| US-4233391-A | PRINTING PLATES | NAPP SYSTEMS (USA) INC. (US) | 1980-11-11 | — | — | US | claimed |
| EP-0020473-A4 | PHOSPHINE ACTIVATED PHOTOSENSITIVE COMPOSITIONS AND PHOTOPOLYMER PRINTING PLATES MADE THEREFROM. | NAPP SYSTEMS INC (US) | 1980-10-16 | — | — | EP | claimed |
| WO-1980000623-A1 | PHOSPHINE ACTIVATED PHOTOSENSITIVE COMPOSITIONS AND PHOTOPOLYMER PRINTING PLATES MADE THEREFROM | NAPP SYSTEMS INC (US) | 1980-04-03 | — | — | WO | claimed |
| CN-111837075-B | Negative super thick film photoresist | 默克专利股份有限公司 | 2024-07-05 | — | — | CN | disclosed |
| EP-3769156-B1 | NEGATIVE-WORKING ULTRA THICK FILM PHOTORESIST | MERCK PATENT GMBH (DE) | 2024-03-20 | — | — | EP | disclosed |
| US-11698586-B2 | Negative-working ultra thick film photoresist | MERCK PATENT GMBH (DE) | 2023-07-11 | — | — | US | disclosed |
| CN-110032042-B | Negative photoresist composition for laser ablation and method of use thereof | 默克专利有限公司 | 2022-05-27 | — | — | CN | disclosed |
| US-20220056281-A1 | APPLICATION OF ANTIMICROBIAL COATINGS USING ATMOSPHERIC PRESSURE PLASMA SPRAY SYSTEMS | TRITON SYSTEMS, INC. | 2022-02-24 | — | — | US | disclosed |
| EP-3511774-B1 | NEGATIVE-WORKING PHOTORESIST COMPOSITION FOR LASER ABLATION AND PROCESS USING IT | MERCK PATENT GMBH (DE) | 2021-10-27 | — | — | EP | disclosed |
| CN-108139670-B | Negative photoresist composition for laser ablation and method of use thereof | 默克专利有限公司 | 2021-07-09 | — | — | CN | disclosed |
| EP-0005379-B1 | PHOTOSENSITIVE COMPOSITIONS CONTAINING CARBONYLIC HALIDES AS ACTIVATORS | Dynachem Corporation (US) | 1981-12-23 | — | — | EP | disclosed |
| US-4207288-A | ANALYSIS OF PHOTOPOLYMERIZATION BY MEASUREMENT OF EXOTHERMIC REACTION | ARMSTRONG CORK COMPANY (US) | 1980-06-10 | — | — | US | disclosed |
| US-4202696-A | Method of removing surface tack of cured free radical polymerized resin composition using organic carbonyl compound | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1980-05-13 | — | — | US | disclosed |
| US-4192684-A | Photosensitive compositions containing hydrogenated 1,2-polybutadiene | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1980-03-11 | — | — | US | disclosed |
| EP-0005379-A2 | Photosensitive compositions containing carbonylic halides as activators | Dynachem Corporation (US) | 1979-11-14 | — | — | EP | disclosed |
| EP-0005380-A2 | Phototropic photosensitive compositions containing a fluoran colorformer | Dynachem Corporation (US) | 1979-11-14 | — | — | EP | disclosed |
| US-4132822-A | Laminates containing polyester resin finishes | PPG INDUSTRIES, INC. (US) | 1979-01-02 | — | — | US | disclosed |
| US-4005244-A | Ultraviolet light curable opacifying compositions | PPG INDUSTRIES, INC. (US) | 1977-01-25 | — | — | US | disclosed |